"Lu\u0148\u00E1\u010Dek, Ji\u0159\u00ED" . "RIV/61989100:27350/08:00019683" . . . "M\u011B\u0159en\u00ED spektr\u00E1ln\u00ED odrazivosti tenk\u00FDch vrstev SiO2 na k\u0159em\u00EDkov\u00FDch podlo\u017Ek\u00E1ch"@cs . "Praha" . . . . . "Spectral reflectometry of SiO2 thin films on the silicon wafers"@en . . "Czechoslovak Association for Crystal Growth (CSACG)" . . "Development of Materials Science in Research and Education, Proceedings of the 18th Joint Seminar" . "Spectral reflectometry of SiO2 thin films on the silicon wafers"@en . "Spectral reflectometry of SiO2 thin films on the silicon wafers" . "2008-09-02+02:00"^^ . . . "Hnanice" . "Z(MSM6198910016)" . . . . . . "Je prezentov\u00E1na alternativn\u00ED metoda m\u011B\u0159en\u00ED spektr\u00E1ln\u00ED odrazivosti tenk\u00E9 vrstvy na substr\u00E1tu. Z\u00E1kladn\u00ED my\u0161lenkou t\u00E9to metody je nahrazen\u00ED standardn\u00EDho m\u011B\u0159en\u00ED, kter\u00E9 pou\u017E\u00EDv\u00E1 kalibrovan\u00E9 zrcadlo, m\u011B\u0159en\u00EDm odrazivosti ve dvou kroc\u00EDch, a to struktury s tenkou vrstvou a hol\u00E9 podlo\u017Eky. Tato dvojn\u00E1sobn\u00E1 srovn\u00E1vac\u00ED metoda dovoluje jednodu\u0161e eliminovat vliv nezn\u00E1m\u00E9 spektr\u00E1ln\u00ED odrazivosti referen\u010Dn\u00EDho zrcadla. Metoda byla \u00FAsp\u011B\u0161n\u011B testov\u00E1na na tenk\u00E9 vrstv\u011B SiO2 na r\u016Fzn\u011B dotovan\u00FDch Si podlo\u017Ek\u00E1ch a z\u00EDskan\u00E1 spektra odrazivosti byla porovn\u00E1na s teoretick\u00FDm modelem."@cs . "M\u011B\u0159en\u00ED spektr\u00E1ln\u00ED odrazivosti tenk\u00FDch vrstev SiO2 na k\u0159em\u00EDkov\u00FDch podlo\u017Ek\u00E1ch"@cs . "[46C92628C3AF]" . . "Spectral reflectance measurement; thin-film structure; bare wafer; non-calibrated mirror"@en . "An alternative method of the reflectance spectrum measurement of a thin film on a wafer is presented. The basic idea of this method is in replacing a standard measurement method employing a calibrated mirror with a two-step reflectance measurement method using both a thin-film structure and a bare wafer. This double comparative method can simply eliminate the unknown reflectance spectrum of the reference mirror. The method was successfully tested on a SiO2 thin film on different B- and P-doped Si substrates. The obtained reflectance spectra were compared with the theoretical model." . "Hlubina, Petr" . "5"^^ . . "Ciprian, Dalibor" . "27350" . "An alternative method of the reflectance spectrum measurement of a thin film on a wafer is presented. The basic idea of this method is in replacing a standard measurement method employing a calibrated mirror with a two-step reflectance measurement method using both a thin-film structure and a bare wafer. This double comparative method can simply eliminate the unknown reflectance spectrum of the reference mirror. The method was successfully tested on a SiO2 thin film on different B- and P-doped Si substrates. The obtained reflectance spectra were compared with the theoretical model."@en . . "978-80-254-0864-3" . "Pot\u016F\u010Dek, Zden\u011Bk" . "Spectral reflectometry of SiO2 thin films on the silicon wafers" . "396449" . . . "RIV/61989100:27350/08:00019683!RIV09-MSM-27350___" . "2"^^ . "Lu\u0148\u00E1\u010Dkov\u00E1, Milena" . "4"^^ .