. . "I, P(GA14-29772S)" . . "Juha, Libor" . . . "Chalupsk\u00FD, Jarom\u00EDr" . . . "interaction of XUV radiation with solid surface; desorption; ablation; nanostructuring; nanopatterning; ablation plume; ablation jet"@en . "RIV/61389021:_____/14:00436689!RIV15-GA0-61389021" . "Interaction of Extreme Ultraviolet Laser Radiation with Solid Surface: Ablation, Desorption, Nanostructuring"@en . . "Frolov, Oleksandr" . "Interaction of Extreme Ultraviolet Laser Radiation with Solid Surface: Ablation, Desorption, Nanostructuring"@en . . "6"^^ . "Interaction of Extreme Ultraviolet Laser Radiation with Solid Surface: Ablation, Desorption, Nanostructuring" . "Schmidt, Ji\u0159\u00ED" . "22282" . "RIV/61389021:_____/14:00436689" . . . . . . . "4"^^ . . "\u0160traus, Jaroslav" . . . "Frolov, Oleksandr" . "Kol\u00E1\u010Dek, Karel" . "Interaction of Extreme Ultraviolet Laser Radiation with Solid Surface: Ablation, Desorption, Nanostructuring" . . . "[3F2E93BF1C83]" . . . "P\u0159edneseno na:International Symposium on High Power Laser Systems and Applications/20./,Chengdu,25.-29.08.2014,\u010C\u00EDna, The area, where interaction of focused XUV laser radiation with solid surface takes place, can be divided according to local fluency into desorption region (if fluency is larger than zero and smaller than ablation threshold) and ablation region (if fluency is equal or larger than this threshold). It turned out that a direct nanostructuring (e.g. imprinting diffraction pattern created on edges of windows of proximity standing grid) is possible in the desorption region only. While for femtosecond pulses the particle (atom/molecule) removal-efficiency in the desorption region is very small ( < 10%), and hence, it can be easily distinguished from the ablation region with 100%, for nanosecond pulses in desorption region this rises at easily ablated materials from 0% at the periphery up to 90% at the ablation contour and, therefore, the boundary between these two"@en . "P\u0159edneseno na:International Symposium on High Power Laser Systems and Applications/20./,Chengdu,25.-29.08.2014,\u010C\u00EDna, The area, where interaction of focused XUV laser radiation with solid surface takes place, can be divided according to local fluency into desorption region (if fluency is larger than zero and smaller than ablation threshold) and ablation region (if fluency is equal or larger than this threshold). It turned out that a direct nanostructuring (e.g. imprinting diffraction pattern created on edges of windows of proximity standing grid) is possible in the desorption region only. While for femtosecond pulses the particle (atom/molecule) removal-efficiency in the desorption region is very small ( < 10%), and hence, it can be easily distinguished from the ablation region with 100%, for nanosecond pulses in desorption region this rises at easily ablated materials from 0% at the periphery up to 90% at the ablation contour and, therefore, the boundary between these two" .