"We present the ion beam analytical technique (RBS, PIXE) characterization of erbium incorporation into the glass surface. In this paper we report on the characterization of our samples fabricated by medium temperature doping of erbium into the glass using electric-field assisted diffusion from Er3+ containing reaction melt. RBS (Rutherford backscattering spectroscopy) is very powerful tool for Er depth profile determination in the glass substrate especially in the case of used glass as GIL 13K, which is free of the heavy trace elements. The PIXE (particle induced X-ray emission spectroscopy) is able to evaluate the Er integral amount in the glass substrate. The incorporated Er amount is influenced by experimental conditions as diffusion time, used current and wt.% of Er in the used melt or post-diffusion annealing treatment" . "4"^^ . "6"^^ . . "Havr\u00E1nek, Vladim\u00EDr" . . "Ion-beam method characterization of erbium incorporation into glass surface for photonics applications" . . . "V \u010Dl\u00E1nku jsou prezentov\u00E1ny jadern\u00E9 analytick\u00E9 metody RBS a PIXE a jejich pou\u017Eit\u00ED p\u0159i studiu inkorporace erbia v povrchu skla. Vzorky byly p\u0159ipravov\u00E1ny pomoc\u00ED difuze Er3+ z taveniny vyu\u017Eit\u00EDm elektrick\u00E9ho pole. RBS Rutherfordovsky zp\u011Btn\u00FD rozptyl je velmi \u00FA\u010Dinnou metodou pro profilov\u00E1n\u00ED Er mno\u017Estv\u00ED difundovan\u00E9ho v substr\u00E1tu skla. Zvl\u00E1\u0161t\u011B v p\u0159\u00EDpad\u011B skla GIL 13K, kde se nenach\u00E1zeji t\u011B\u017Ek\u00E9 stopov\u00E9 prvky a pozad\u00ED se tak v\u00FDznamn\u011B eliminuje. PIXE tedy metoda rentgenovsk\u00E9 fluorescence je schopna ur\u010Dit velmi p\u0159esn\u011B integr\u00E1ln\u00ED mno\u017Estvi Er v cel\u00E9m vzorku. Kombinac\u00ED t\u011Bchto dvou metod m\u016F\u017Eeme odhadnout velmi p\u0159esn\u011B hloubku inkorporace Er ve skle, kter\u00E1 je velmi v\u00FDznamn\u00E1 pro jeho dal\u0161\u00ED aplikace ve fotonice. Mno\u017Estvi Er je ovlivn\u011Bno depozi\u010Dn\u00EDmi podm\u00EDnkami tj. intenzitou pou\u017Eit\u00E9ho el. pole a mno\u017Estv\u00EDm Er v tavenine, n\u00E1sledn\u011B profil Er m\u016F\u017Ee b\u00FDt prohlouben \u017E\u00EDh\u00E1n\u00EDm."@cs . "111;114" . "Pe\u0159ina, Vratislav" . "lanthanides;glass surfaces;X-ray emission"@en . "\u0160pirkov\u00E1, J." . "We present the ion beam analytical technique (RBS, PIXE) characterization of erbium incorporation into the glass surface. In this paper we report on the characterization of our samples fabricated by medium temperature doping of erbium into the glass using electric-field assisted diffusion from Er3+ containing reaction melt. RBS (Rutherford backscattering spectroscopy) is very powerful tool for Er depth profile determination in the glass substrate especially in the case of used glass as GIL 13K, which is free of the heavy trace elements. The PIXE (particle induced X-ray emission spectroscopy) is able to evaluate the Er integral amount in the glass substrate. The incorporated Er amount is influenced by experimental conditions as diffusion time, used current and wt.% of Er in the used melt or post-diffusion annealing treatment"@en . . . "RIV/61389005:_____/04:00105595!RIV/2005/GA0/A49005/N" . "Ion-beam method characterization of erbium incorporation into glass surface for photonics applications"@en . . "T\u0159e\u0161n\u00E1kov\u00E1-Nebolov\u00E1, P." . . . . "568972" . . "RIV/61389005:_____/04:00105595" . . . "Surface Science" . . . . "Inkorporace erbia do povrchu skel urcenych pro fotoniku a jeji charakterizace pomoci analyzy iontovymi svazky"@cs . . . "[AF3ED01A390B]" . "0039-6028" . "Ion-beam method characterization of erbium incorporation into glass surface for photonics applications"@en . . "566" . "1" . "Inkorporace erbia do povrchu skel urcenych pro fotoniku a jeji charakterizace pomoci analyzy iontovymi svazky"@cs . "Mackov\u00E1, Anna" . "3"^^ . "P(GA106/03/0505), P(GP102/01/D069), Z(AV0Z1048901), Z(MSM 223100002)" . "Ion-beam method characterization of erbium incorporation into glass surface for photonics applications" . "NL - Nizozemsko" . . . "Telezhnikov\u00E1, O." .