. "RIV/61388955:_____/07:00088024!RIV08-MSM-61388955" . "1"^^ . . "5"^^ . "RIV/61388955:_____/07:00088024" . "Optimization of the silylation procedure of thin mesoporous SiO2 films with cationic trimethylaminopropylammonium groups" . . "Wark, M." . . . . . "SiO2; cationic trimethylaminopropylammonium groups; mesoporous silicas"@en . "Rathousk\u00FD, Ji\u0159\u00ED" . "Studies in surface science and catalysis" . "[49E742D3F160]" . "Fattakhova Rohlfing, D." . "Mesoporous silicas are excellent hosts for incorporation of various guest molecules. The properties of the relatively inert silica surface can be drastically changes by the covalent grafting of functional groups, such as thiol-, amino- or alkylammonium ones, by silylation with chloro- or alkoxysilanes. While the silylation procedure has been optimized for powdered mesoporous silica materials with differing porosity, it has not been developed for mesoporous silica thin films yet, even if the obvious differences in diffusion properties and pore accessibility of powders and films would imply the different conditions needed for their silylation. Recently we have faced a serious problem of poor reproducibility of silylation procedure of silica films when investigating their applicability as a matrix for anchoring electrochemically active species and dye molecules. Therefore, the optimization of their silylation procedure has been aimed at in this communication." . "439909" . . . "Optimization of the silylation procedure of thin mesoporous SiO2 films with cationic trimethylaminopropylammonium groups" . . "978-0-444-53084-4" . "Optimization of the silylation procedure of thin mesoporous SiO2 films with cationic trimethylaminopropylammonium groups"@en . . . "Optimization of the silylation procedure of thin mesoporous SiO2 films with cationic trimethylaminopropylammonium groups"@en . "Mesoporous silicas are excellent hosts for incorporation of various guest molecules. The properties of the relatively inert silica surface can be drastically changes by the covalent grafting of functional groups, such as thiol-, amino- or alkylammonium ones, by silylation with chloro- or alkoxysilanes. While the silylation procedure has been optimized for powdered mesoporous silica materials with differing porosity, it has not been developed for mesoporous silica thin films yet, even if the obvious differences in diffusion properties and pore accessibility of powders and films would imply the different conditions needed for their silylation. Recently we have faced a serious problem of poor reproducibility of silylation procedure of silica films when investigating their applicability as a matrix for anchoring electrochemically active species and dye molecules. Therefore, the optimization of their silylation procedure has been aimed at in this communication."@en . "Optimalizace silyla\u010Dn\u00ED procedury pro tenk\u00E9 mesopor\u00E9zn\u00ED filmy SiO2 s kationick\u00FDmi trimethylaminopropylamoniov\u00FDmi skupinami"@cs . . . "Amsterdam" . "V\u00FDvoj postsyntetick\u00E9 silyla\u010Dn\u00ED procedury pro tenk\u00E9 mesopor\u00E9zn\u00ED filmy SiO2 s kationick\u00FDmi trimethylaminopropylamoniov\u00FDmi skupinami, zam\u011B\u0159en\u00FD na \u00FA\u010Dinnou a reprodukovatelnou inkorporaci anionick\u00FDch molekul, jasn\u011B uk\u00E1zal rozd\u00EDlnou silyla\u010Dn\u00ED reaktivitu film\u016F a pr\u00E1\u0161kov\u00FDch mesopor\u00E9zn\u00EDch materi\u00E1l\u016F. Hlavn\u00ED rozd\u00EDl je v p\u0159\u00EDpad\u011B film\u016F zp\u016Fsoben omezenou dostupnost\u00ED povrchu siliky pro silyla\u010Dn\u00ED \u010Dinidlo, co\u017E m\u00E1 za n\u00E1sledek tendenci k blokov\u00E1n\u00ED p\u00F3r\u016F pro del\u0161\u00ED reak\u010Dn\u00ED \u010Dasy. N\u00EDzk\u00E1 koncentrace silyla\u010Dn\u00EDho \u010Dinidla a kr\u00E1tk\u00E9 reak\u010Dn\u00ED \u010Dasy jsou proto nutnou podm\u00EDnkou pro reprodukovatelnou silylaci tenk\u00FDch mesopor\u00E9zn\u00EDch film\u016F. D\u00E1le kr\u00E1tk\u00E1 aktivace povrchu v m\u00EDrn\u011B alkalick\u00E9m roztoku umo\u017E\u0148uje dos\u00E1hnout optim\u00E1ln\u00ED silyla\u010Dn\u00ED efektivity."@cs . . "573;577" . "Elsevier" . "P(1M0577), R, Z(AV0Z40400503)" . "Recent progress in mesostructured materials" . . . . "3"^^ . "Optimalizace silyla\u010Dn\u00ED procedury pro tenk\u00E9 mesopor\u00E9zn\u00ED filmy SiO2 s kationick\u00FDmi trimethylaminopropylamoniov\u00FDmi skupinami"@cs .