. . "Syst\u00E9m pro in-situ m\u011B\u0159en\u00ED rezistance aktivn\u00EDch senzorick\u00FDch vrstev v pr\u016Fb\u011Bhu depozice katalytick\u00FDch nano\u010D\u00E1stic."@cs . "Syst\u00E9m pro in-situ m\u011B\u0159en\u00ED rezistance aktivn\u00EDch senzorick\u00FDch vrstev v pr\u016Fb\u011Bhu depozice katalytick\u00FDch nano\u010D\u00E1stic." . . "Bul\u00ED\u0159, Ji\u0159\u00ED" . . . . "Syst\u00E9m pro in-situ m\u011B\u0159en\u00ED rezistance aktivn\u00EDch senzorick\u00FDch vrstev v pr\u016Fb\u011Bhu depozice katalytick\u00FDch nano\u010D\u00E1stic." . "Kopeck\u00FD, Du\u0161an" . "in-situ measurement of resistivity, nanoparticles, sensors, catalysis"@en . . "Nanosputter 1" . "V r\u00E1mci v\u00FDvoje byl navr\u017Een a zkonstruov\u00E1n syst\u00E9m pro pr\u016Fb\u011B\u017En\u00E9 monitorov\u00E1n\u00ED rezistance aktivn\u00ED vrstvy senzor\u016F b\u011Bhem procesu p\u0159ipra\u0161ov\u00E1n\u00ED katalytick\u00E9ho kovu. P\u0159ipravovan\u00E9 sou\u010D\u00E1stky-senzory maj\u00ED elektrickou v\u00FDstupn\u00ED veli\u010Dinu, a proto je mo\u017Enost kontinu\u00E1ln\u00EDho sledov\u00E1n\u00ED hodnot rezistance v pr\u016Fb\u011Bhu jejich v\u00FDroby naprosto kl\u00ED\u010Dov\u00E1. Doty\u010Dn\u00FD syst\u00E9m (funk\u010Dn\u00ED vzorek) se skl\u00E1d\u00E1 ze speci\u00E1ln\u00EDho adapt\u00E9ru obsahuj\u00EDc\u00EDho patici pro senzor, precizn\u00ED masky zabra\u0148uj\u00EDc\u00ED depozici kovu mimo aktivn\u00ED vrstvu, reduk\u010Dn\u00EDho vakuov\u00E9ho kusu s pr\u016Fchodkou pro elektrick\u00E9 vodi\u010De, multimetru a m\u011B\u0159ic\u00EDho PC vybaven\u00E9ho programem, kter\u00FD zaznamen\u00E1v\u00E1 a vyhodnocuje zm\u011Bny rezistance aktivn\u00ED vrstvy senzoru jako funkci \u010Dasu. Syst\u00E9m byl navr\u017Een prim\u00E1rn\u011B pro pou\u017Eit\u00ED s napra\u0161ova\u010Dkou DENTON HP V Desk TSC, ale je mo\u017En\u00E9 ho adaptovat i pro jin\u00E9 za\u0159\u00EDzen\u00ED. Pro m\u011B\u0159en\u00ED rezistance je v syst\u00E9mu pou\u017Eit multimetr Agilent 34410A, kter\u00FD umo\u017Enuje m\u011B\u0159it rezistanci senzoru v rozsahu od 1 GOhmu a\u017E do jednotek mikroOhmu. Multimetr je p\u0159ipojen k m\u011B\u0159ic\u00EDmu PC p\u0159es sb\u011Brnici USB. Pro m\u011B\u0159en\u00ED depozi\u010Dn\u00ED rychlosti je pou\u017Eita QCM mikrov\u00E1ha Inficon SQM-160. Ovl\u00E1dac\u00ED program byl vytvo\u0159en v prost\u0159ed\u00ED NI LabVIEW 2012. P\u0159i testech syst\u00E9mu se prok\u00E1zalo, \u017Ee jej lze vyu\u017E\u00EDt pro zastaven\u00ED depozice katalytick\u00FDch nano\u010D\u00E1stic v p\u0159esn\u011B definovan\u00E9 oblasti tzv. perkola\u010Dn\u00EDho prahu, co\u017E zajist\u00ED maxim\u00E1ln\u00ED citlivost p\u0159ipravovan\u00FDch senzor\u016F."@cs . . "P(GAP108/11/1298)" . "Vl\u010Dek, Jan" . . "Vr\u0148ata, Martin" . "\u0160kodov\u00E1, Jitka" . "[D23D01AA6739]" . "173079" . "RIV/60461373:22340/12:43894375" . "V r\u00E1mci v\u00FDvoje byl navr\u017Een a zkonstruov\u00E1n syst\u00E9m pro pr\u016Fb\u011B\u017En\u00E9 monitorov\u00E1n\u00ED rezistance aktivn\u00ED vrstvy senzor\u016F b\u011Bhem procesu p\u0159ipra\u0161ov\u00E1n\u00ED katalytick\u00E9ho kovu. P\u0159ipravovan\u00E9 sou\u010D\u00E1stky-senzory maj\u00ED elektrickou v\u00FDstupn\u00ED veli\u010Dinu, a proto je mo\u017Enost kontinu\u00E1ln\u00EDho sledov\u00E1n\u00ED hodnot rezistance v pr\u016Fb\u011Bhu jejich v\u00FDroby naprosto kl\u00ED\u010Dov\u00E1. Doty\u010Dn\u00FD syst\u00E9m (funk\u010Dn\u00ED vzorek) se skl\u00E1d\u00E1 ze speci\u00E1ln\u00EDho adapt\u00E9ru obsahuj\u00EDc\u00EDho patici pro senzor, precizn\u00ED masky zabra\u0148uj\u00EDc\u00ED depozici kovu mimo aktivn\u00ED vrstvu, reduk\u010Dn\u00EDho vakuov\u00E9ho kusu s pr\u016Fchodkou pro elektrick\u00E9 vodi\u010De, multimetru a m\u011B\u0159ic\u00EDho PC vybaven\u00E9ho programem, kter\u00FD zaznamen\u00E1v\u00E1 a vyhodnocuje zm\u011Bny rezistance aktivn\u00ED vrstvy senzoru jako funkci \u010Dasu. Syst\u00E9m byl navr\u017Een prim\u00E1rn\u011B pro pou\u017Eit\u00ED s napra\u0161ova\u010Dkou DENTON HP V Desk TSC, ale je mo\u017En\u00E9 ho adaptovat i pro jin\u00E9 za\u0159\u00EDzen\u00ED. Pro m\u011B\u0159en\u00ED rezistance je v syst\u00E9mu pou\u017Eit multimetr Agilent 34410A, kter\u00FD umo\u017Enuje m\u011B\u0159it rezistanci senzoru v rozsahu od 1 GOhmu a\u017E do jednotek mikroOhmu. Multimetr je p\u0159ipojen k m\u011B\u0159ic\u00EDmu PC p\u0159es sb\u011Brnici USB. Pro m\u011B\u0159en\u00ED depozi\u010Dn\u00ED rychlosti je pou\u017Eita QCM mikrov\u00E1ha Inficon SQM-160. Ovl\u00E1dac\u00ED program byl vytvo\u0159en v prost\u0159ed\u00ED NI LabVIEW 2012. P\u0159i testech syst\u00E9mu se prok\u00E1zalo, \u017Ee jej lze vyu\u017E\u00EDt pro zastaven\u00ED depozice katalytick\u00FDch nano\u010D\u00E1stic v p\u0159esn\u011B definovan\u00E9 oblasti tzv. perkola\u010Dn\u00EDho prahu, co\u017E zajist\u00ED maxim\u00E1ln\u00ED citlivost p\u0159ipravovan\u00FDch senzor\u016F." . "p\u0159\u00EDjemce je z\u00E1rove\u0148 u\u017Eivatelem, smlouva o vyu\u017Eit\u00ED se dle pravidel neuzav\u00EDr\u00E1" . "RIV/60461373:22340/12:43894375!RIV13-GA0-22340___" . "6"^^ . "Fitl, P\u0159emysl" . . "5"^^ . . . "System for in-situ measurement of resistivity of sensor active layer during the deposition of catalytic nanoparticles."@en . . . . "Effusion cell was constructed for the deposition of organic compounds in the high vacuum conditions. When compared with commercially available cells, it differs mainly by using a special corrosion resistant coaxial heating element and also by a unique design of its arrangement. The temperature of source material is measured with a thermocouple which is located in the platform holder for alumina container. Special construction allows defined heating of the source material by thermal radiation in the range from room temperature up to 600\u00B0C. The cell design ensures a high temperature stability and homogeneity throughout the whole volume of the organic source material. These properties are essential for vacuum deposition of organic substances. During development of the cell we optimized its design using thermal imaging diagnostics. The device was made in total count of 3 pieces."@en . . "22340" . . . . . . . "Syst\u00E9m pro in-situ m\u011B\u0159en\u00ED rezistance aktivn\u00EDch senzorick\u00FDch vrstev v pr\u016Fb\u011Bhu depozice katalytick\u00FDch nano\u010D\u00E1stic."@cs . "System for in-situ measurement of resistivity of sensor active layer during the deposition of catalytic nanoparticles."@en . . "Syst\u00E9m umo\u017Enuje optimalizovat p\u0159ipra\u0161ov\u00E1n\u00ED katalytick\u00FDch nano\u010D\u00E1stic na aktivn\u00ED vrstvy senzor\u016F. Depozice nano\u010D\u00E1stic je pr\u016Fb\u011B\u017En\u011B monitorov\u00E1na a je mo\u017Ene ji zastavit za optim\u00E1ln\u00EDch podm\u00EDnek vzhledem k vlastnostem senzoru. V d\u016Fsledku toho je mo\u017En\u00E9 minimalizovat ztr\u00E1ty p\u0159ipra\u0161ovan\u00FDch kov\u016F (Pt,Pd atd) - v d\u016Fsledku toho je mo\u017En\u00E9 sn\u00ED\u017Eit provozn\u00ED ztr\u00E1ty. Syst\u00E9m byl dosud vyroben v po\u010Dtu 1 ks." . .