. "RIV/60461373:22310/09:00021534!RIV10-MSM-22310___" . "DC pulzn\u00ED plazmatick\u00FD syst\u00E9m s dut\u00FDmi katodami pro depozici tenk\u00FDch vrstev TiO2:N ? efekt velikosti proudu v pulzu na vlastnosti vrstev" . . . "TiO2 thin films; plasmatic; nitrogen doping"@en . "2"^^ . "Tato pr\u00E1ce se zab\u00FDv\u00E1 p\u0159\u00EDpravou tenk\u00FDch vrstev oxidu titani\u010Dit\u00E9ho c\u00EDlen\u011B modifikovan\u00FDch jejich dopac\u00ED dus\u00EDkem. Vrstvy byly p\u0159ipravov\u00E1ny pomoc\u00ED n\u00EDzkotlak\u00E9ho plazmatick\u00E9ho syst\u00E9mu v reaktoru s dut\u00FDmi katodami. P\u0159ipraven\u00E9 vrstvy byly krom\u011B d\u016Fkladn\u00E9 fyzik\u00E1ln\u00ED charakterizace (XRD, Ramanova spektroskopie, UV-Vis, XPS, AFM) posuzov\u00E1ny na z\u00E1klad\u011B jejich fotoelektrochemick\u00FDch vlastnost\u00ED." . . . . "Nanomateri\u00E1ly a fotokatal\u00FDza - Sborn\u00EDk p\u0159\u00EDsp\u011Bvk\u016F" . "Vysok\u00E1 \u0161kola chemicko-technologick\u00E1 v Praze" . "Praha" . "Kment, \u0160t\u011Bp\u00E1n" . "DC pulse plasmatic system with hollow cathodes for TiO2:N layers deposition ? effect of current quantity in pulse on layer properties"@en . "Kr\u00FDsa, Josef" . "Tato pr\u00E1ce se zab\u00FDv\u00E1 p\u0159\u00EDpravou tenk\u00FDch vrstev oxidu titani\u010Dit\u00E9ho c\u00EDlen\u011B modifikovan\u00FDch jejich dopac\u00ED dus\u00EDkem. Vrstvy byly p\u0159ipravov\u00E1ny pomoc\u00ED n\u00EDzkotlak\u00E9ho plazmatick\u00E9ho syst\u00E9mu v reaktoru s dut\u00FDmi katodami. P\u0159ipraven\u00E9 vrstvy byly krom\u011B d\u016Fkladn\u00E9 fyzik\u00E1ln\u00ED charakterizace (XRD, Ramanova spektroskopie, UV-Vis, XPS, AFM) posuzov\u00E1ny na z\u00E1klad\u011B jejich fotoelektrochemick\u00FDch vlastnost\u00ED."@cs . "DC pulzn\u00ED plazmatick\u00FD syst\u00E9m s dut\u00FDmi katodami pro depozici tenk\u00FDch vrstev TiO2:N ? efekt velikosti proudu v pulzu na vlastnosti vrstev"@cs . "[27F423CB9A8E]" . "4"^^ . "Hubi\u010Dka, Z." . . "RIV/60461373:22310/09:00021534" . "Hnanice, CZ" . "2"^^ . . "22310" . . "DC pulzn\u00ED plazmatick\u00FD syst\u00E9m s dut\u00FDmi katodami pro depozici tenk\u00FDch vrstev TiO2:N ? efekt velikosti proudu v pulzu na vlastnosti vrstev" . . . "309170" . . "DC pulse plasmatic system with hollow cathodes for TiO2:N layers deposition ? effect of current quantity in pulse on layer properties"@en . . . "P(1M0577)" . . "DC pulzn\u00ED plazmatick\u00FD syst\u00E9m s dut\u00FDmi katodami pro depozici tenk\u00FDch vrstev TiO2:N ? efekt velikosti proudu v pulzu na vlastnosti vrstev"@cs . . "978-80-7080-717-0" . "Kluso\u0148, Petr" . "2009-06-08+02:00"^^ . . "This work describes the preparation of thin Titanium(IV) oxide semiconducting thin films modified by nitrogen doping. Layers were deposited by means of low pressure plasmatic system in the reactor with hollow cathodes. Prepared films were except detailed characterization (XRD, Raman spectroscopy, UV-Vis, XPS, AFM) tested then for their electrochemical properties."@en .