. "2007-12-04+01:00"^^ . "Plasmatick\u00E9 nan\u00E1\u0161en\u00ED a fotoelektrochemick\u00E9 vlastnosti tenk\u00FDch vrstev oxidu titani\u010Dit\u00E9ho"@cs . "2"^^ . "22310" . "[CADEA1FCBBF9]" . "Kluso\u0148, Petr" . "Plasma deposition and Photoelectrochemical properties of Nanoscaled Titanium(IV) oxide thin layers" . "Hnanice" . . "Stra\u0148\u00E1k, V." . "3"^^ . . "R\u016Fzn\u00E9 techniky byly pou\u017Eity pro p\u0159\u00EDpravu tenk\u00FDch nanovrstev oxidu titani\u010Dit\u00E9ho. Nan\u00E1\u0161en\u00ED vrstev bylo prov\u00E1d\u011Bno v prost\u0159ed\u00ED chemicky aktivn\u00EDho plazmatu za vyu\u017Eit\u00ED p\u0159\u00EDstroj\u016F PVD ?hollow cathode plasma? sputtering syst\u00E9mem, PVD magnetronov\u00FDm sputteringem a PECVD technologi\u00ED vyu\u017E\u00EDvaj\u00EDc\u00ED surfatronovou plasmu. P\u0159\u00EDprava vrstev metodou sol-gel prob\u00EDhala v prost\u0159ed\u00ED reverzn\u00EDch micel. V\u0161echny typy vrstev byly testov\u00E1ny na foto-indukovan\u00E9 elektrochemick\u00E9 vlastnosti na z\u00E1klad\u011B vyhodnocen\u00ED polariza\u010Dn\u00EDch k\u0159ivek a odpov\u00EDdaj\u00EDc\u00EDch fotoproud\u016F"@cs . . . "7"^^ . "Plasma deposition and Photoelectrochemical properties of Nanoscaled Titanium(IV) oxide thin layers"@en . "Kr\u00FDsa, Josef" . . "P(1M0577), P(KAN400720701)" . . "PVD; sol-gel; titanium dioxide; photocurrent"@en . "Proceedings of the workshop Recent advances in photochemistry, electrochemistry and photocatalysis" . "Hubi\u010Dka, Martin" . "Vysok\u00E1 \u0161kola chemicko-technologick\u00E1 v Praze" . . "\u010Cada, M." . "Virostko, P." . "Various techniques were used for the preparation of titanium (IV) oxide nanoscaled thin films. The deposition of the layers was carried out in the environmental of chemically active plasma due to the utilization of plasma assisted device including PVD hollow cathode plasma jet sputtering system, PVD magnetron sputtering and PECVD technique using surfatron produced plasma discharge as a jet type. The sol-gel process realized in the reverse micelle environment was chosen as a purely chemical procedure. All type were tested then for their photo-induced electrochemical properties based on evaluation of polarization curves and corresponding photocurrents." . . . . "Plasmatick\u00E9 nan\u00E1\u0161en\u00ED a fotoelektrochemick\u00E9 vlastnosti tenk\u00FDch vrstev oxidu titani\u010Dit\u00E9ho"@cs . "Praha" . "386779" . "RIV/60461373:22310/08:00020173" . "Various techniques were used for the preparation of titanium (IV) oxide nanoscaled thin films. The deposition of the layers was carried out in the environmental of chemically active plasma due to the utilization of plasma assisted device including PVD hollow cathode plasma jet sputtering system, PVD magnetron sputtering and PECVD technique using surfatron produced plasma discharge as a jet type. The sol-gel process realized in the reverse micelle environment was chosen as a purely chemical procedure. All type were tested then for their photo-induced electrochemical properties based on evaluation of polarization curves and corresponding photocurrents."@en . . . "RIV/60461373:22310/08:00020173!RIV09-AV0-22310___" . "Plasma deposition and Photoelectrochemical properties of Nanoscaled Titanium(IV) oxide thin layers" . . "Kment, \u0160." . . "Plasma deposition and Photoelectrochemical properties of Nanoscaled Titanium(IV) oxide thin layers"@en . . "978-80-7080-680-7" . . . .