. "RIV/60461373:22310/07:00018685" . "Byly srovn\u00E1v\u00E1ny fotoelektrochemick\u00E9 vlastnosti vrstev oxidu titani\u010Dit\u00E9ho p\u0159ipraven\u00E9 tepelnou oxidac\u00ED titanu (500-750\u00B0C) a \u010D\u00E1sticov\u00FDch vrstev P25, p\u0159edev\u0161\u00EDm z pohledu oxidace kys. \u0161\u0165avelov\u00E9. Vrstvy oxidu p\u0159ipraven\u00E9 tepeln\u011B m\u011Bly rutilovou strukturu s velikost\u00ED \u010D\u00E1stic kolem 100 nm. Hodnoty po\u010D\u00E1te\u010Dn\u00ED efektivity p\u0159evodu fotonu na proud se zvy\u0161ovaly se zvy\u0161uj\u00EDc\u00ED se tlou\u0161\u0165kou vrstvy rutilu a dosahovaly maxima p\u0159i 1 m. Fotoproudy \u010D\u00E1sticov\u00FDch TiO2 vrstev byly p\u0159ibli\u017En\u011B o jeden \u0159\u00E1d ni\u017E\u0161\u00ED z d\u016Fvodu \u0161patn\u00E9ho kontaktu jednotliv\u00FDch \u010D\u00E1stic, co\u017E m\u00E1 za n\u00E1sledek vysok\u00FD elektrick\u00FD odpor t\u011Bchto vrstev. P\u0159\u00EDtomnost kys. \u0160\u0165avelov\u00E9 nem\u00E1 prakticky \u017E\u00E1dn\u00FD vliv na fotoproudy v p\u0159\u00EDpad\u011B tepeln\u011B p\u0159ipraven\u00FDch vrstev TiO2, ale v p\u0159\u00EDpad\u011B \u010D\u00E1sticov\u00FDch vrstev se fotoproud siln\u011B zvy\u0161uje. Je to zp\u016Fsobeno adsorpc\u00ED kys. \u0161\u0165avelov\u00E9 a jej\u00ED n\u00E1slednou oxidac\u00ED fotogenerovan\u00FDmi d\u011Brami. Pro koncentraci kys. \u0161\u0165avelov\u00E9 ni\u017E\u0161\u00ED ne\u017E 1mM se hodnota fotoproudu sni\u017Euje v d\u016Fsledku limitovan\u00E9ho p\u0159enosu hmoty, co\u017E m\u00E1 za n\u00E1sledek sni\u017Eov\u00E1n\u00ED koncentrace kys. \u0161\u0165avel"@cs . . "Waldner, Georg" . . "The photoelectrochemical properties of titanium dioxide layers, prepared by thermal oxidation of titanium at 500-750 C, were compared with those of layers of particulate (Degussa) P25, especially for oxidation of oxalic acid. The thermally formed oxide layers had rutile structures with a particle size of about 100 nm. Values of incident photon-to-current conversion efficiencies increased with rutile layer thickness and reached a maximum at about 1 m. Photocurrents for particulate TiO2 layers were about one order lower than those for thermal layers, due to the poor contact among individual particles, resulting in high electric resistance of the whole layer. The presence of oxalic acid had no effect on the photocurrent of thermal TiO2 layers, while in the case of porous particulate layers, the photocurrent increased strongly, due to oxalate adsorption and subsequent enhanced oxidation rate with photogenerated holes. For oxalic acid concentrations <= 10-3 M, the photocurrent decayed due to mass transf"@en . "1"^^ . . "7"^^ . "titanium dioxide; rutile; Degussa P25; thermal oxidation; photocurrent IPCE; open circuit potential; oxalic acid"@en . "P(1M0577), Z(MSM6046137301)" . "Effect of oxidisable substrates on the photoelectrocatalytic properties of thermally grown and particulate TiO2 layers" . . "The photoelectrochemical properties of titanium dioxide layers, prepared by thermal oxidation of titanium at 500-750 C, were compared with those of layers of particulate (Degussa) P25, especially for oxidation of oxalic acid. The thermally formed oxide layers had rutile structures with a particle size of about 100 nm. Values of incident photon-to-current conversion efficiencies increased with rutile layer thickness and reached a maximum at about 1 m. Photocurrents for particulate TiO2 layers were about one order lower than those for thermal layers, due to the poor contact among individual particles, resulting in high electric resistance of the whole layer. The presence of oxalic acid had no effect on the photocurrent of thermal TiO2 layers, while in the case of porous particulate layers, the photocurrent increased strongly, due to oxalate adsorption and subsequent enhanced oxidation rate with photogenerated holes. For oxalic acid concentrations <= 10-3 M, the photocurrent decayed due to mass transf" . "DE - Spolkov\u00E1 republika N\u011Bmecko" . "419036" . . . . "Zl\u00E1mal, Martin" . . "37" . "3"^^ . "[8238BC934C6A]" . "Vliv oxidovateln\u00FDch substr\u00E1t\u016F na fotoelektrokatalytick\u00E9 vlastnosti tepeln\u011B p\u0159ipraven\u00FDch a \u010D\u00E1sticov\u00FDch TiO2 vrstev."@cs . "0021-891X" . . . "Kr\u00FDsa, Josef" . "Effect of oxidisable substrates on the photoelectrocatalytic properties of thermally grown and particulate TiO2 layers"@en . "RIV/60461373:22310/07:00018685!RIV08-MSM-22310___" . "Effect of oxidisable substrates on the photoelectrocatalytic properties of thermally grown and particulate TiO2 layers"@en . . . . . "22310" . "Journal of Applied Electrochemistry" . "1313-1319" . . . "Vliv oxidovateln\u00FDch substr\u00E1t\u016F na fotoelektrokatalytick\u00E9 vlastnosti tepeln\u011B p\u0159ipraven\u00FDch a \u010D\u00E1sticov\u00FDch TiO2 vrstev."@cs . . . . . "Effect of oxidisable substrates on the photoelectrocatalytic properties of thermally grown and particulate TiO2 layers" .