"RIV/60461373:22310/06:00020444" . . "1-2" . "000236309200028" . "P\u0159\u00EDprava a charakterizace fotokatalytick\u00FDch TiO2-SiO2-PDMS vrstev na skle"@cs . . . "0040-6090" . "22310" . "Preparation and characterization of photocatalytical TiO2-SiO2-PDMS layers on glass"@en . . . . . "494215" . . "Byl zji\u0161\u0165ov\u00E1n vliv r\u016Fzn\u00E9ho mol\u00E1rn\u00EDho mno\u017Estv\u00ED v\u00FDchoz\u00EDch l\u00E1tek na vlastnosti materi\u00E1lu o slo\u017Een\u00ED TiO2/SiO2/polydimethylsiloxan. Tlou\u0161\u0165ka p\u0159ipraven\u00FDch vrstev se pohybovala v rozmez\u00ED hodnot od 1.2 \u03BCm do 400 nm v z\u00E1vislosti na teplot\u011B v\u00FDpalu a slo\u017Een\u00ED vrstev. Bylo zji\u0161t\u011Bno, \u017Ee pokles koncentrace TiO2 nem\u00E1 vliv na rychlost fotodegradace do mol\u00E1rn\u00EDho pom\u011Bru v\u00FDchoz\u00EDch slo\u017Eek TiO2/PDMS 0.25/0.5. Naopak, pokud se sn\u00ED\u017E\u00ED obsah SiO2 v materi\u00E1lu, dojde ke sn\u00ED\u017Een\u00ED chemick\u00E9 odolnosti p\u0159ipraven\u00FDch vrstev."@cs . "P(1M0577), P(GA106/03/0500), Z(MSM6046137302)" . "Preparation and characterization of photocatalytical TiO2-SiO2-PDMS layers on glass" . "GB - Spojen\u00E9 kr\u00E1lovstv\u00ED Velk\u00E9 Brit\u00E1nie a Severn\u00EDho Irska" . "Preparation and characterization of photocatalytical TiO2-SiO2-PDMS layers on glass" . "Novotn\u00E1, Petra" . "PDMS; Photocatalytic activity; Hybrid material"@en . "RIV/60461373:22310/06:00020444!RIV09-MSM-22310___" . "Matou\u0161ek, Josef" . "Thin Solid Films" . . . . "Inorganic?organic materials composed of TiO2/SiO2/polydimethylsiloxane with several molar ratios of the precursors in the starting solution have been studied. The thickness of the layers ranges from 1.2 \u03BCm to 400 nm, depending on the burning temperature and on the composition of the layers. The results indicate that the decrease of the concentration of TiO2 does not have a critical impact on the speed of photodegradation, for the molar ratio TiO2/PDMS equal to 0.25/0.5 or higher. When the amount of SiO2 decreases, the chemical resistance decreases, too."@en . . "Inorganic?organic materials composed of TiO2/SiO2/polydimethylsiloxane with several molar ratios of the precursors in the starting solution have been studied. The thickness of the layers ranges from 1.2 \u03BCm to 400 nm, depending on the burning temperature and on the composition of the layers. The results indicate that the decrease of the concentration of TiO2 does not have a critical impact on the speed of photodegradation, for the molar ratio TiO2/PDMS equal to 0.25/0.5 or higher. When the amount of SiO2 decreases, the chemical resistance decreases, too." . "P\u0159\u00EDprava a charakterizace fotokatalytick\u00FDch TiO2-SiO2-PDMS vrstev na skle"@cs . . . . . "4"^^ . . "502" . "2"^^ . . . "Preparation and characterization of photocatalytical TiO2-SiO2-PDMS layers on glass"@en . "[226632CE3CBF]" . "2"^^ .