. . "978-1-4244-8572-7" . "23640" . . "2"^^ . . . "RIV/49777513:23640/10:00503615!RIV11-MSM-23640___" . . . "Fischer, Marinus" . "Zeman, Miro" . "4"^^ . . . . "5"^^ . "ASDAM 2010" . "Structure and optical properties of the hydrogen diluted a-Si:H thin films prepared by PECVD with different deposition temperatures" . "The paper deals with the hydrogenated amorphous silicon (a-Si:H) films about 300 nm in thickness prepared by using rf-PECVD with hydrogen dilution R = 10 of the silane source gas in the amorphous growth regime onto clean Corning Eagle 2000 glass substrates at different deposition temperatures ranging from 50 to 200 \u00B0C. Structural and optical properties of the films were obtained from X-ray diffraction and UV-Vis spectrophotometry. The full width at half maximum of the first scattering peak decreases with increasing of the deposition temperature up to 150 \u00B0C and then remains constant. Optical band-gaps are from 1.65 to 1.76 eV, which slightly decrease with increasing deposition temperature, whereas the refractive index increases with increasing deposition temperature. This indicates that the density of the films at higher temperature has increased."@en . . . . "a-Si:H; physical properties; deposition temperature; hydrogen diluted"@en . "New York" . "IEEE Nuclear and Plasma Sciences Society" . "Smolenice Castle, Slovakia" . "[FC27B38B3A96]" . "M\u00FCllerov\u00E1, Jarmila" . "Structure and optical properties of the hydrogen diluted a-Si:H thin films prepared by PECVD with different deposition temperatures" . "RIV/49777513:23640/10:00503615" . "Netrvalov\u00E1, Marie" . . "Structure and optical properties of the hydrogen diluted a-Si:H thin films prepared by PECVD with different deposition temperatures"@en . "P(1M06031)" . "290475" . . "The paper deals with the hydrogenated amorphous silicon (a-Si:H) films about 300 nm in thickness prepared by using rf-PECVD with hydrogen dilution R = 10 of the silane source gas in the amorphous growth regime onto clean Corning Eagle 2000 glass substrates at different deposition temperatures ranging from 50 to 200 \u00B0C. Structural and optical properties of the films were obtained from X-ray diffraction and UV-Vis spectrophotometry. The full width at half maximum of the first scattering peak decreases with increasing of the deposition temperature up to 150 \u00B0C and then remains constant. Optical band-gaps are from 1.65 to 1.76 eV, which slightly decrease with increasing deposition temperature, whereas the refractive index increases with increasing deposition temperature. This indicates that the density of the films at higher temperature has increased." . "Structure and optical properties of the hydrogen diluted a-Si:H thin films prepared by PECVD with different deposition temperatures"@en . "\u0160utta, Pavol" . . . . "2010-01-01+01:00"^^ .