. "\u0160\u016Fna, Jan" . "[DFEB8EAE5690]" . "Pou\u017Eit\u00ED chemick\u00E9ho odlept\u00E1v\u00E1n\u00ED pro m\u011B\u0159en\u00ED zbytkov\u00FDch nap\u011Bt\u00ED v tenk\u00FDch povlac\u00EDch metodou \u00FAb\u011Bru"@cs . . "3"^^ . "\u0160vantner, Michal" . "The layer removal method is used for the residual stress measurement in thin Ti Films. Concentrated hydrochloric acid is used for the successive layer removal of the coating. The etching process is analyzed. Removed layer thickness is measured and the residual stress of the Ti film is determined based on changes of the samples deflection." . "Hokovce, Slovensko" . . "Mu\u017E\u00EDk, Tom\u00E1\u0161" . "2006-01-01+01:00"^^ . . . "Metoda \u00FAb\u011Bru je vyu\u017E\u00EDv\u00E1na pro m\u011B\u0159en\u00ED zbytkov\u00E9ho nap\u011Bt\u00ED v tenk\u00FDch povlac\u00EDch Ti. K postupn\u00E9mu odstra\u0148ov\u00E1n\u00ED vrstvy je pou\u017E\u00EDv\u00E1na kyselina chlorovod\u00EDkov\u00E1. Pr\u016Fb\u011Bh procesu odlept\u00E1v\u00E1n\u00ED je analyzov\u00E1n. Tlou\u0161\u0165ka odleptan\u00E9 vrstvy je zaznamen\u00E1v\u00E1na a zbytkov\u00E9 nap\u011Bt\u00ED v tenk\u00E9m povlaku Ti je ur\u010Dov\u00E1no na z\u00E1klad\u011B zm\u011Bny pr\u016Fhybu vzorku."@cs . "Using of chemical etching for layer removal residual stress measurement in thin films"@en . . "Z(MSM4977751302)" . "Hutn\u00EDcka analytika 2006" . "80-86380-34-3" . "The layer removal method is used for the residual stress measurement in thin Ti Films. Concentrated hydrochloric acid is used for the successive layer removal of the coating. The etching process is analyzed. Removed layer thickness is measured and the residual stress of the Ti film is determined based on changes of the samples deflection."@en . . . . "2 THETA" . "\u010Cesk\u00FD T\u011B\u0161\u00EDn" . "5"^^ . "23640" . . "Using of chemical etching for layer removal residual stress measurement in thin films"@en . "505375" . "residual stress; layer removal method; coatings"@en . . "RIV/49777513:23640/06:00000106" . . "Using of chemical etching for layer removal residual stress measurement in thin films" . . "Pou\u017Eit\u00ED chemick\u00E9ho odlept\u00E1v\u00E1n\u00ED pro m\u011B\u0159en\u00ED zbytkov\u00FDch nap\u011Bt\u00ED v tenk\u00FDch povlac\u00EDch metodou \u00FAb\u011Bru"@cs . . "Using of chemical etching for layer removal residual stress measurement in thin films" . . . "3"^^ . "RIV/49777513:23640/06:00000106!RIV07-MSM-23640___" . . . "55-59" .