"Surface and Coatings Technology" . "Hard multifunctional Hf-B-Si-C films prepared by pulsed magnetron sputtering" . . "Meletis, Efstathios I." . "\u010Cerstv\u00FD, Radom\u00EDr" . . . "Zeman, Petr" . "Zuzjakov\u00E1, \u0160\u00E1rka" . . . "000344423100030" . "7"^^ . . "Hard multifunctional Hf-B-Si-C films prepared by pulsed magnetron sputtering"@en . . "0257-8972" . "Mare\u0161, Pavel" . "GB - Spojen\u00E9 kr\u00E1lovstv\u00ED Velk\u00E9 Brit\u00E1nie a Severn\u00EDho Irska" . . "18774" . . "Hou\u0161ka, Ji\u0159\u00ED" . "Vl\u010Dek, Jaroslav" . . . . "P(GA14-03875S)" . . "Oxidation resistance; Electrical conductivity; Hardness; Pulsed magnetron sputtering; Nanocomposite materials; Hf-B-Si-C films"@en . . "10.1016/j.surfcoat.2013.12.007" . "257" . "2014" . "RIV/49777513:23520/14:43922810" . . "http://dx.doi.org/10.1016/j.surfcoat.2013.12.007" . . . "7"^^ . "23520" . "Hf-B-Si-C films were deposited onto silicon and glass substrates using pulsed magnetron co-sputtering of a single B4C-Hf-Si target (at a fixed 15% Hf fraction and a varying 0-50% Si fraction in the target erosion area) in pure argon. We focus on the effect of the Si content in the films. The film structure changes from nanocolumnar (at 0-7 at.% of Si) to nanocomposite (at around 10 at.% of Si) to amorphous (at higher Si contents). Both nanocolumnar and nanocomposite HfB2-based films exhibit a hardness of up to 37 GPa and a high H/E* ratio of around 0.15. The Si incorporation leads to a significant reduction of the compressive stress of films and improvement of their oxidation resistance (unmeasurable mass change after annealing up to 800 \u00B0C at 35 at.% of Si). All films exhibit a high electrical conductivity and very smooth defect-free surfaces with an average roughness below 1 nm. Consequently, the films may be used as a new class of hard and electrically conductive protective coatings with a high oxidation resistance at elevated temperatures." . . . . . "10"^^ . . "Hard multifunctional Hf-B-Si-C films prepared by pulsed magnetron sputtering" . "Zhang, Minghui" . "Jiang, Jiechao" . "Hf-B-Si-C films were deposited onto silicon and glass substrates using pulsed magnetron co-sputtering of a single B4C-Hf-Si target (at a fixed 15% Hf fraction and a varying 0-50% Si fraction in the target erosion area) in pure argon. We focus on the effect of the Si content in the films. The film structure changes from nanocolumnar (at 0-7 at.% of Si) to nanocomposite (at around 10 at.% of Si) to amorphous (at higher Si contents). Both nanocolumnar and nanocomposite HfB2-based films exhibit a hardness of up to 37 GPa and a high H/E* ratio of around 0.15. The Si incorporation leads to a significant reduction of the compressive stress of films and improvement of their oxidation resistance (unmeasurable mass change after annealing up to 800 \u00B0C at 35 at.% of Si). All films exhibit a high electrical conductivity and very smooth defect-free surfaces with an average roughness below 1 nm. Consequently, the films may be used as a new class of hard and electrically conductive protective coatings with a high oxidation resistance at elevated temperatures."@en . "Hard multifunctional Hf-B-Si-C films prepared by pulsed magnetron sputtering"@en . "[A9FADFD343DC]" . . . "RIV/49777513:23520/14:43922810!RIV15-GA0-23520___" . "Kohout, Ji\u0159\u00ED" .