"Multifunctional Si-B-C-N films with exceptionally high thermal stability are becoming increasingly attractive because of their potential applications in coating technologies, and in high-temperature electronics and optoelectronics. In the present work, amorphous Si-B-C-N films were deposited onto SiC and Cu floating substrates using pulsed dc magnetron co-sputtering of a single boron carbide (25%)-silicon (75 %) target in an argon-nitrogen gas mixture. High-quality defect-free films with smooth surfaces (average roughness of 4 nm) were produced. The films exhibited a hardness of 22 GPa, an effective Young's modulus of 170 GPa and an elastic recovery of 75%. The oxidation resistance of the Si-B-C-N films in air was found to be very high up to 1600 \u00B0C. Annealing of the as-deposited films in He to 1400 \u00B0C led to a slight decrease in the refractive index from 1.92 to 1.91 and to an increase in the extinction coefficient from 0.0003 to 0.003 (both at the wavelength of 550 nm)." . "23520" . "7"^^ . . "Calta, Pavel" . "Surface & Coatings Technology" . . . "Pulsed reactive magnetron sputtering of high-temperature Si-B-C-N films with high optical transparency" . "Multifunctional Si-B-C-N films with exceptionally high thermal stability are becoming increasingly attractive because of their potential applications in coating technologies, and in high-temperature electronics and optoelectronics. In the present work, amorphous Si-B-C-N films were deposited onto SiC and Cu floating substrates using pulsed dc magnetron co-sputtering of a single boron carbide (25%)-silicon (75 %) target in an argon-nitrogen gas mixture. High-quality defect-free films with smooth surfaces (average roughness of 4 nm) were produced. The films exhibited a hardness of 22 GPa, an effective Young's modulus of 170 GPa and an elastic recovery of 75%. The oxidation resistance of the Si-B-C-N films in air was found to be very high up to 1600 \u00B0C. Annealing of the as-deposited films in He to 1400 \u00B0C led to a slight decrease in the refractive index from 1.92 to 1.91 and to an increase in the extinction coefficient from 0.0003 to 0.003 (both at the wavelength of 550 nm)."@en . "Vl\u010Dek, Jaroslav" . "1" . "0257-8972" . . "RIV/49777513:23520/13:43918474!RIV14-GA0-23520___" . . . "P(GAP108/12/0393)" . "Pulsed reactive magnetron sputtering of high-temperature Si-B-C-N films with high optical transparency"@en . . . . "\u010Cerstv\u00FD, Radom\u00EDr" . . "226" . . "US - Spojen\u00E9 st\u00E1ty americk\u00E9" . . . . "Steidl, Petr" . "Defect-free surfaces; High optical transparency; High thermal stability; Pulsed magnetron sputtering; Si-B-C-N films"@en . . "Zeman, Petr" . "000320415400006" . "RIV/49777513:23520/13:43918474" . . "6"^^ . . "http://dx.doi.org/10.1016/j.surfcoat.2013.03.033" . . . "10.1016/j.surfcoat.2013.03.033" . "Kohout, Ji\u0159\u00ED" . . . "Hou\u0161ka, Ji\u0159\u00ED" . "Pulsed reactive magnetron sputtering of high-temperature Si-B-C-N films with high optical transparency" . "[C294726CFA67]" . . "101030" . "7"^^ . . . "Pulsed reactive magnetron sputtering of high-temperature Si-B-C-N films with high optical transparency"@en .