. "Pe\u0159ina, Vratislav" . "23520" . "Surface & Coatings Technology" . . "Hard nanocrystalline Zr-B-C-N films with high electrical conductivity prepared by pulsed magnetron sputtering" . "Kohout, Ji\u0159\u00ED" . "Hard nanocrystalline Zr-B-C-N films with high electrical conductivity prepared by pulsed magnetron sputtering"@en . . "I, P(ED1.1.00/02.0090), P(OC10045)" . "Prok\u0161ov\u00E1, \u0160\u00E1rka" . . . . . "Hard Zr-B-C-(N) films were deposited on Si(100) substrates by pulsed magnetron co-sputtering of a single boron carbide-zirconium target in various nitrogen-argon gas mixtures. The target was formed by a boron carbide plate overlapped by zirconium stripes which covered 15 or 45 % of the target erosion area. The nitrogen fractions in the gas mixture were in the range from 0 to 50 % at the total pressure of the gas mixture of 0.5 Pa. Hard (37 GPa) nanocrystalline Zr-B-C-N films with very low compressive stress (0.4 GPa) and high electrical conductivity (resistivity of 2.3 microohmmeter) were deposited in argon discharge at the 15 % Zr fraction in the target erosion area. Hard (37 GPa) nanocomposite Zr-B-C-N films with low compressive stress (0.6 GPa) and even higher electrical conductivity (resistivity of 1.7 microohmmeter) were deposited at the 45 % Zr fraction in the target erosion area and 5 % nitrogen fraction in the gas mixture. The former films exhibited very high oxidation resistance in air up to 650 Celsius degrees, while the latter to 550 Celsius degrees."@en . "10.1016/j.surfcoat.2012.08.084" . "Hard nanocrystalline Zr-B-C-N films with high electrical conductivity prepared by pulsed magnetron sputtering"@en . . "RIV/49777513:23520/13:43917535" . . . . "6"^^ . . "Hard Zr-B-C-(N) films were deposited on Si(100) substrates by pulsed magnetron co-sputtering of a single boron carbide-zirconium target in various nitrogen-argon gas mixtures. The target was formed by a boron carbide plate overlapped by zirconium stripes which covered 15 or 45 % of the target erosion area. The nitrogen fractions in the gas mixture were in the range from 0 to 50 % at the total pressure of the gas mixture of 0.5 Pa. Hard (37 GPa) nanocrystalline Zr-B-C-N films with very low compressive stress (0.4 GPa) and high electrical conductivity (resistivity of 2.3 microohmmeter) were deposited in argon discharge at the 15 % Zr fraction in the target erosion area. Hard (37 GPa) nanocomposite Zr-B-C-N films with low compressive stress (0.6 GPa) and even higher electrical conductivity (resistivity of 1.7 microohmmeter) were deposited at the 45 % Zr fraction in the target erosion area and 5 % nitrogen fraction in the gas mixture. The former films exhibited very high oxidation resistance in air up to 650 Celsius degrees, while the latter to 550 Celsius degrees." . "Vl\u010Dek, Jaroslav" . "1" . . "Zeman, Petr" . . "0257-8972" . . . "\u010Cerstv\u00FD, Radom\u00EDr" . "US - Spojen\u00E9 st\u00E1ty americk\u00E9" . . . "Oxidation resistance; Pulsed magnetron sputtering; Electrical conductivity; Hardness; Nanocrystalline Zr-B-C-N films"@en . . "6"^^ . . "215" . "7"^^ . . "RIV/49777513:23520/13:43917535!RIV14-MSM-23520___" . . . "[26D5388698F8]" . . . "Steidl, Petr" . "Hard nanocrystalline Zr-B-C-N films with high electrical conductivity prepared by pulsed magnetron sputtering" . "77049" . "000315659600027" .