"Zirconium dioxide; HiPIMS; Reactive sputtering; High-rate reactive deposition"@en . . . . . "Vl\u010Dek, Jaroslav" . . . "Hou\u0161ka, Ji\u0159\u00ED" . . . . "Lazar, Jan" . "RIV/49777513:23520/11:43895686!RIV12-MSM-23520___" . . "High-Rate Reactive Deposition of Transparent Zirconium Dioxide Films Using High-Power Pulsed DC Magnetron Sputtering"@en . "High-Rate Reactive Deposition of Transparent Zirconium Dioxide Films Using High-Power Pulsed DC Magnetron Sputtering" . . . "5"^^ . "High-Rate Reactive Deposition of Transparent Zirconium Dioxide Films Using High-Power Pulsed DC Magnetron Sputtering" . . . . . . . "5"^^ . "202088" . . "High-power pulsed dc magnetron sputtering with an effective reactive gas flow control, developed by us, was used for the reactive deposition of transparent zirconium dioxide films. The depositions were performed using a strongly unbalanced magnetron with a planar zirconium target of 100 mm diameter in argon-oxygen gas mixtures at the argon pressure of 2 Pa. The repetition frequency was 500 Hz at duty cycles ranging from 2.5% to 10%. The substrate temperatures were less than 300 degrees of Celsius during the depositions of films on a floating substrate at the distance of 100 mm from the target. The increase in the average target power density from 5 to 100 watts per square centimeter in a period at the same duty cycle of 10% resulted in a rapid rise in the deposition rate from 11 nm/min to 73 nm/min." . . "RIV/49777513:23520/11:43895686" . . . "Rezek, Ji\u0159\u00ED" . "\u010Cerstv\u00FD, Radom\u00EDr" . "High-Rate Reactive Deposition of Transparent Zirconium Dioxide Films Using High-Power Pulsed DC Magnetron Sputtering"@en . "[D55602B3B3A7]" . "High-power pulsed dc magnetron sputtering with an effective reactive gas flow control, developed by us, was used for the reactive deposition of transparent zirconium dioxide films. The depositions were performed using a strongly unbalanced magnetron with a planar zirconium target of 100 mm diameter in argon-oxygen gas mixtures at the argon pressure of 2 Pa. The repetition frequency was 500 Hz at duty cycles ranging from 2.5% to 10%. The substrate temperatures were less than 300 degrees of Celsius during the depositions of films on a floating substrate at the distance of 100 mm from the target. The increase in the average target power density from 5 to 100 watts per square centimeter in a period at the same duty cycle of 10% resulted in a rapid rise in the deposition rate from 11 nm/min to 73 nm/min."@en . . "23520" . "P(OC10045), Z(MSM4977751302)" .