. "RIV/49777513:23520/08:00500791" . "Crystallization of amorphous titanium dioxide films with different thickness (50-100 nm) deposited on silicon substrates was investigated by in-situ isochronal and isothermal annealing inhigh-temperature chamber in the X-ray diffractometer. It was found that the crystallization depends strongly on the film thickness, especially below about 500 nm and it is slow for very thinfilms. The process can be well described by the Avrami equation modified by the initial time of crystallization. All the parameters of the equation vary with thin thickness." . . "XRD in-situ study of crystallization of magnetron-deposited TiO2 thin films"@en . "Crystallization of amorphous titanium dioxide films with different thickness (50-100 nm) deposited on silicon substrates was investigated by in-situ isochronal and isothermal annealing inhigh-temperature chamber in the X-ray diffractometer. It was found that the crystallization depends strongly on the film thickness, especially below about 500 nm and it is slow for very thinfilms. The process can be well described by the Avrami equation modified by the initial time of crystallization. All the parameters of the equation vary with thin thickness."@en . . . . "[320F78867D15]" . . "Krystalizace amorfn\u00EDch vrstev TiO2 o r\u016Fzn\u00FDch tlou\u0161\u0165k\u00E1ch deponovan\u00FDch na k\u0159em\u00EDkov\u00E9 substr\u00E1ty byla zkoum\u00E1na pomoc\u00ED in-situ izochronn\u00EDho a izotermick\u00E9ho \u017E\u00EDh\u00E1n\u00ED ve vysokoteplotn\u00ED komo\u0159e v rtg difraktometru. Bylo zji\u0161t\u011Bno, \u017Ee krystalizace siln\u011B z\u00E1vis\u00ED na tlou\u0161\u0165ce vrstvy, obzvl\u00E1\u0161t\u011B pro tlou\u0161\u0165ky pod 500nm, kde krystalizace je velmi pomal\u00E1 pro velmi tenk\u00E9 vrstvy. Proces m\u016F\u017Ee b\u00FDt velmi dob\u0159e pops\u00E1n Avramiho rovnic\u00ED modifikovanou po\u010D\u00E1te\u010Dn\u00EDm \u010Dasem krystalizace. V\u0161echny parametry rovnice se m\u011Bn\u00ED s tlou\u0161\u0165kou vrstvy."@cs . . "Musil, Jind\u0159ich" . "TiO2; crystallization; post-annealing; in-situ XRD"@en . "2"^^ . . . "4"^^ . "XRD in-situ studie krystalizace magnetronov\u011B nan\u00E1\u0161en\u00FDch tenk\u00FDch vrstev TiO2"@cs . "XRD in-situ study of crystallization of magnetron-deposited TiO2 thin films"@en . . "XRD in-situ study of crystallization of magnetron-deposited TiO2 thin films" . . . . . "2008-11-20+01:00"^^ . "XRD in-situ study of crystallization of magnetron-deposited TiO2 thin films" . . . "XRD in-situ studie krystalizace magnetronov\u011B nan\u00E1\u0161en\u00FDch tenk\u00FDch vrstev TiO2"@cs . "23520" . "RIV/49777513:23520/08:00500791!RIV09-MSM-23520___" . "Proceedings of ICTF 14 & RSD2008" . "978-90-334-7347-0" . "Ghent" . . "Ghent" . . "4"^^ . "P(GA106/06/0327), Z(MSM4977751302)" . "Nichtov\u00E1, L." . "\u0160\u00EDcha, Jan" . . "405961" . "Ghent University" . . "Ku\u017Eel, Radom\u00EDr" .