"Metodou reaktivn\u00EDho magnetronov\u00E9ho napra\u0161ov\u00E1n\u00ED byly p\u0159ipraveny vrstvy syst\u00E9mu Si-B-C-N. Pr\u00E1ce se zam\u011B\u0159uje na hled\u00E1n\u00ED vztah\u016F mezi procesn\u00EDmi parametry, prvkov\u00FDm slo\u017Een\u00EDm, vazebnou strukturou a mechanick\u00FDmi, tribologick\u00FDmi a optick\u00FDmi vlastnostmi p\u0159ipraven\u00FDch materi\u00E1l\u016F. Vrstvy vykazuj\u00ED vysokou tvrdost (do 36 GPa), dobrou adhezi k substr\u00E1tu Si(100) p\u0159i n\u00EDzk\u00E9m tlakov\u00E9m pnut\u00ED (1.0-1.6 GPa), index lomu od 1.8 do 2.2 (p\u0159i 550 nm) a extink\u010Dn\u00ED koeficient od 2 x 10%224 do 0.3. D\u00EDky t\u011Bmto vlastnostem jsou vrstvy Si-B-C-N vhodn\u00E9 pro pou\u017Eit\u00ED v tribologick\u00FDch a optoelektronick\u00FDch aplikac\u00EDch."@cs . "9"^^ . . "Kala\u0161, Ji\u0159\u00ED" . "Si-B-C-N films; Magnetron sputtering; Elemental composition; Bonding structure; Tribological and optical properties; Hardness; Stress"@en . . "RIV/49777513:23520/08:00500501!RIV09-MSM-23520___" . "Mechanick\u00E9 a optick\u00E9 vlastnosti vrstev kvatern\u00E1rn\u00EDho syst\u00E9mu Si-B-C-N"@cs . "Mechanical and optical properties of quaternary Si-B-C-N films prepared by reactive magnetron sputtering"@en . "Quaternary Si-B-C-N films were prepared using reactive direct current magnetron co-sputtering. We focused on complex relationships between process parameters, elemental composition, bonding structure, and mechanical, tribological and optical properties of the deposited materials. The films exhibit a high hardness (up to 36 GPa) and a good adhesion to Si(100) substrates at a low compressive stress (1.0-1.6 GPa), refractive index ranging from 1.8 to 2.2 (at 550 nm) and an extinction coefficient between 2 x 10%224 and 0.3. The Si-B-C-N films appear attractive for both tribological and optoelectronic applications." . . "RIV/49777513:23520/08:00500501" . . . . "8"^^ . . "Potock\u00FD, \u0160t\u011Bp\u00E1n" . "Martin\u016F, Ludv\u00EDk" . . . . "000259727900004" . "Z(MSM4977751302)" . "Mechanical and optical properties of quaternary Si-B-C-N films prepared by reactive magnetron sputtering"@en . . . . "Mechanick\u00E9 a optick\u00E9 vlastnosti vrstev kvatern\u00E1rn\u00EDho syst\u00E9mu Si-B-C-N"@cs . . "23520" . "NL - Nizozemsko" . . . . "Thin Solid Films" . "[A899E14624F6]" . "21" . "Quaternary Si-B-C-N films were prepared using reactive direct current magnetron co-sputtering. We focused on complex relationships between process parameters, elemental composition, bonding structure, and mechanical, tribological and optical properties of the deposited materials. The films exhibit a high hardness (up to 36 GPa) and a good adhesion to Si(100) substrates at a low compressive stress (1.0-1.6 GPa), refractive index ranging from 1.8 to 2.2 (at 550 nm) and an extinction coefficient between 2 x 10%224 and 0.3. The Si-B-C-N films appear attractive for both tribological and optoelectronic applications."@en . "Jedrzejowski, P." . . "Mechanical and optical properties of quaternary Si-B-C-N films prepared by reactive magnetron sputtering" . . "Mechanical and optical properties of quaternary Si-B-C-N films prepared by reactive magnetron sputtering" . . "Hou\u0161ka, Ji\u0159\u00ED" . . . "0040-6090" . . "Soukup, Zbyn\u011Bk" . "378233" . "\u010C\u00ED\u017Eek, Ji\u0159\u00ED" . "Vl\u010Dek, Jaroslav" . "516" . "Klemberg-Sapieha, J. E." . "6"^^ . .