"Influence of substrate bias voltage on structure and properties of hard Si-B-C-N films prepared by reactive magnetron sputtering" . . "0.75"^^ . . . . . "Metodika hodnocen\u00ED, v\u00FDsledek hodnocen\u00FD ji\u017E v p\u0159edchoz\u00EDm hodnocen\u00ED, body se p\u0159eb\u00EDraj\u00ED." . "http://www.isvav.cz/h11/resultDetail.do?rowId=RIV%2F49777513%3A23520%2F07%3A00000199!RIV08-MSM-23520___"^^ . . "35.213"^^ . "1PIRt..DojN+8FxbQxbv+Hez.5g=" . . . . . "46.951"^^ . . "RIV/49777513:23520/07:00000199!RIV08-MSM-23520___" . "Diamond and Related Materials" .