"RIV/49777513:23520/07:00000152" . "5"^^ . . "Vl\u010Dek, Jaroslav" . "Pajdarov\u00E1, Andrea Dag" . . "Time-resolved Langmuir probe diagnostics of high-power pulsed dc magnetron discharges during deposition of copper films"@en . "high-power magnetron; pulsed magnetron; magnetron deposition; Langmuir probe diagnostics"@en . "1960-1962" . . . "Praha" . "23520" . "Praha" . . "RIV/49777513:23520/07:00000152!RIV08-MSM-23520___" . . "XXVIII International conference on phenomena in ionized gases" . . "\u010Casov\u011B rozli\u0161en\u00E1 diagnostika Langmuirovou sondou ve vysokov\u00FDkonov\u00FDch pulzn\u00EDch dc magnetonov\u00FDch v\u00FDboj\u00EDch b\u011Bhem depozice m\u011Bd\u011Bn\u00FDch vrstev"@cs . . "Time-resolved Langmuir probe diagnostics of high-power pulsed dc magnetron discharges during deposition of copper films"@en . "Electron energy distribution function and local plasma parameters were investigated at the substrate position (100mm from the target) by means of time-resolved Langmuir probe diagnostics during high-power pulsed dc magnetron sputtering of copper films. Very high plasma densities were achieved at the voltage pulse repetition frequency, the pulse duration, the argon pressure and the average pulse current. At the same conditions, the kinetic temperature of electrons rose with an increasing power during a pulse. After an initial stage it was in the range 10500-12500K. Negative peaks of the floating potential were registered at the very beginning of the voltage pulse"@en . . "Kudl\u00E1\u010Dek, Pavel" . . . "Luk\u00E1\u0161, Jan" . "Time-resolved Langmuir probe diagnostics of high-power pulsed dc magnetron discharges during deposition of copper films" . . . "Musil, Jind\u0159ich" . "\u010Casov\u011B rozli\u0161en\u00E1 diagnostika Langmuirovou sondou ve vysokov\u00FDkonov\u00FDch pulzn\u00EDch dc magnetonov\u00FDch v\u00FDboj\u00EDch b\u011Bhem depozice m\u011Bd\u011Bn\u00FDch vrstev"@cs . . "2007-01-01+01:00"^^ . "Elektronov\u00E9 rozd\u011Blovac\u00ED funkce podle energie a lok\u00E1ln\u00ED plazmov\u00E9 parametry byly zkoum\u00E1ny v pozici u substr\u00E1tu (100mm od ter\u010De) pomoc\u00ED \u010Dasov\u011B rozli\u0161en\u00E9 diagnostiky Langmuirovou sondou b\u011Bhem vysokov\u00FDkonov\u00E9ho pulzn\u00EDho dc magnetronov\u00E9ho napra\u0161ov\u00E1n\u00ED m\u011Bd\u011Bn\u00FDch vrstev. Velmi vysok\u00FDch hustot plazmatu (a\u017E 2.1012cm-3) bylo dosa\u017Eeno p\u0159i opakovac\u00ED frekvenci pulz\u016F nap\u011Bt\u00ED fr=1kHz, d\u00E9lce pulzu t1=200μs, tlaku argonu p=1Pa a pr\u016Fm\u011Brn\u00E9m proudu v pulzu Ida=50A. P\u0159i stejn\u00FDch podm\u00EDnk\u00E1ch kinetick\u00E1 energie elektron\u016F rostla s rostouc\u00EDm v\u00FDkonem b\u011Bhem pulzu. Po inicia\u010Dn\u00ED f\u00E1zi byla v intervalu 10500-12500K. Na za\u010D\u00E1tku pulzu byly zaznamen\u00E1ny poklesy plovouc\u00EDho potenci\u00E1lu plazmatu."@cs . "978-80-87026-01-4" . . "\u00DAstav fyziky plazmatu AV \u010CR" . "Time-resolved Langmuir probe diagnostics of high-power pulsed dc magnetron discharges during deposition of copper films" . . . "3"^^ . "Electron energy distribution function and local plasma parameters were investigated at the substrate position (100mm from the target) by means of time-resolved Langmuir probe diagnostics during high-power pulsed dc magnetron sputtering of copper films. Very high plasma densities were achieved at the voltage pulse repetition frequency, the pulse duration, the argon pressure and the average pulse current. At the same conditions, the kinetic temperature of electrons rose with an increasing power during a pulse. After an initial stage it was in the range 10500-12500K. Negative peaks of the floating potential were registered at the very beginning of the voltage pulse" . . . . . . "5"^^ . "455209" . "[C97B8C7E9B41]" . "P(ME 673), Z(MSM4977751302)" . .