. . "\u0160a\u0161ek, Martin" . . "Plasma Processes and Polymers" . "1612-8850" . "Z(MSM4977751302)" . "Musil, Jind\u0159ich" . . . . "23520" . . "\u010Cl\u00E1nek se zab\u00FDv\u00E1 oxidac\u00ED Cu, Zr, ZrCu, ZrO2 a Zr-Cu-O vrstev b\u011Bhem podepozi\u010Dn\u00EDho \u017E\u00EDh\u00E1n\u00ED v proud\u00EDc\u00EDm vzduchu. Vrstvy byly nadeponov\u00E1ny s pou\u017Eit\u00EDm nevyv\u00E1\u017Een\u00E9ho dc magnetronu z \u010Dist\u00FDch nebo skl\u00E1dan\u00FDch ter\u010D\u016F v Ar nebo ve sm\u011Bsi Ar+O2. Oxida\u010Dn\u00ED chov\u00E1n\u00ED vrstev bylo charakterizov\u00E1no pomoc\u00ED vysokoteplotn\u00ED termogravimetrie a XRD. Mechanick\u00E9 vlastnosti byly m\u011B\u0159eny na mikrotvrdom\u011Bru Fischerscope H100. Tepeln\u00E9 \u017E\u00EDh\u00E1n\u00ED bylo provedeno v \u0161irok\u00E9m rozsahu od 300 do 1300 \u00B0C. Zvl\u00E1\u0161tn\u00ED pozornost byla v\u011Bnov\u00E1na oxidaci Cu a efektu obsahu Cu v Zr-Cu-O vrstv\u00E1ch na jejich oxida\u010Dn\u00ED odolnost. Bylo uk\u00E1z\u00E1no, \u017Ee p\u0159em\u011Bna Cu <-> Cu2O p\u0159i ~1040 \u00B0C je vratn\u00FD proces."@cs . . "5"^^ . "440386" . . "5"^^ . "Jirout, Michal" . "Oxidation of Sputtered Cu, Zr, ZrCu, ZrO2, and Zr-Cu-O Films during Thermal Annealing in Flowing Air"@en . "0" . . "[4BB4D7DAD794]" . "Oxidation of Sputtered Cu, Zr, ZrCu, ZrO2, and Zr-Cu-O Films during Thermal Annealing in Flowing Air" . . . "RIV/49777513:23520/07:00000105!RIV08-MSM-23520___" . "1"^^ . . . . . "DE - Spolkov\u00E1 republika N\u011Bmecko" . . "\u010Cerstv\u00FD, Radom\u00EDr" . "The article deals with oxidation of Cu,Zr,ZrCu,ZrO2, and Zr-Cu-O films during post-deposition thermal annealing in flowing air. The films were deposited using dc unbalanced magnetron from pure or composed target in Ar or an Ar+O2 mixture. The oxidation behavior of the films was characterized by high-temperature thermogravimetry and XRD. Mechanical properties were measured by a microindenter Fischerscope H100. Thermal annealing was carried out over a wide range from 300 to 1300\u00B0C. Special attention was devoted to the oxidation of Cu and to the effect of Cu content in Zr-Cu-O films on the oxidation resistance. It was shown that the conversation CuO-Cu2 at 1040\u00B0C is a reversible process." . . "Oxidation of Sputtered Cu, Zr, ZrCu, ZrO2, and Zr-Cu-O Films during Thermal Annealing in Flowing Air" . . "The article deals with oxidation of Cu,Zr,ZrCu,ZrO2, and Zr-Cu-O films during post-deposition thermal annealing in flowing air. The films were deposited using dc unbalanced magnetron from pure or composed target in Ar or an Ar+O2 mixture. The oxidation behavior of the films was characterized by high-temperature thermogravimetry and XRD. Mechanical properties were measured by a microindenter Fischerscope H100. Thermal annealing was carried out over a wide range from 300 to 1300\u00B0C. Special attention was devoted to the oxidation of Cu and to the effect of Cu content in Zr-Cu-O films on the oxidation resistance. It was shown that the conversation CuO-Cu2 at 1040\u00B0C is a reversible process."@en . "films; magnetron sputtering; oxidation resistance; thermogravimetry; ZrO2 films; Zr-Cu-O films"@en . "RIV/49777513:23520/07:00000105" . "Zeman, Petr" . . . . "Oxidace napra\u0161ovan\u00FDch Cu, Zr, ZrCu, ZrO2 a Zr-Cu-O vrstev b\u011Bhem tepeln\u00E9ho"@cs . "Oxidation of Sputtered Cu, Zr, ZrCu, ZrO2, and Zr-Cu-O Films during Thermal Annealing in Flowing Air"@en . "Oxidace napra\u0161ovan\u00FDch Cu, Zr, ZrCu, ZrO2 a Zr-Cu-O vrstev b\u011Bhem tepeln\u00E9ho"@cs . "0" .