"[A802AD5F3470]" . "8"^^ . "Byl proveden systematick\u00FD v\u00FDzkum reaktivn\u00EDho magnetronov\u00E9ho napra\u0161ov\u00E1n\u00ED tvrd\u00FDch kvatern\u00E1rn\u00EDch Si-B-C-N materi\u00E1l\u016F. Si-B-C-N vrstvy byly deponov\u00E1ny na Si a SiC substr\u00E1ty rozpra\u0161ov\u00E1n\u00EDm C-Si-B nebo B4C-Si ter\u010De ve sm\u011Bsi dus\u00EDku a argonu. Prvkov\u00E9 slo\u017Een\u00ED vrstev, jejich vazebn\u00E1 struktura, nanostruktura, mechanick\u00E9, tribologick\u00E9 a optick\u00E9 vlastnosti spole\u010Dn\u011B s oxida\u010Dn\u00ED odolnost\u00ED byly kontrolov\u00E1ny obsahem Si v erozn\u00ED z\u00F3n\u011B ter\u010De, obsahem Ar ve v\u00FDbojov\u00E9 sm\u011Bsi, z\u00E1porn\u00FDm radiofrekven\u010Dn\u011B indukovan\u00FDm p\u0159edp\u011Bt\u00EDm na substr\u00E1tu a teplotou substr\u00E1tu. Energie a tok iont\u016F dopadaj\u00EDc\u00EDch na rostouc\u00ED vrstvy byly ur\u010Deny z m\u011B\u0159en\u00FDch v\u00FDbojov\u00FDch charakteristik. Hmotnostn\u00ED spektroskopie byla pou\u017Eita pro zji\u0161t\u011Bn\u00ED sl"@cs . . "Novel quaternary Si-B-C-N films prepared by reactive magnetron sputtering" . "Novel quaternary Si-B-C-N films prepared by reactive magnetron sputtering"@en . "23520" . . . . . "Z(MSM4977751302)" . "In this work, a systematic investigation of reactive magnetron sputtering of hard quaternary Si-B-C-N materials has been carried out. The Si-B-C-N films were deposited on Si and SiC substrates by dc magnetron co sputtering using a single C-Si-B or B4C-Si target in nitrogen-argon gas mixtures. Elemental compositions of the films, their bonding structure, nanostructure, and mechanical, tribological and optical properties, together with their oxidation resistance in air, were controlled by the Si fraction in the magnetron target erosion area, the Ar fraction in the gas mixture, the rf induced negative substrate bias voltage and the substrate temperature. The energy and flux of ions bombarding the growing films were determined on the basis of the measured discharge characteristics."@en . . . . "\u010Capek, Ji\u0159\u00ED" . . . "International Plasma Chemistry Society" . "Kala\u0161, Ji\u0159\u00ED" . . "In this work, a systematic investigation of reactive magnetron sputtering of hard quaternary Si-B-C-N materials has been carried out. The Si-B-C-N films were deposited on Si and SiC substrates by dc magnetron co sputtering using a single C-Si-B or B4C-Si target in nitrogen-argon gas mixtures. Elemental compositions of the films, their bonding structure, nanostructure, and mechanical, tribological and optical properties, together with their oxidation resistance in air, were controlled by the Si fraction in the magnetron target erosion area, the Ar fraction in the gas mixture, the rf induced negative substrate bias voltage and the substrate temperature. The energy and flux of ions bombarding the growing films were determined on the basis of the measured discharge characteristics." . "RIV/49777513:23520/07:00000023!RIV08-MSM-23520___" . "437920" . . . . . "2007-01-01+01:00"^^ . "Nov\u00E9 kvatern\u00E1rn\u00ED Si-B-C-N vrstvy p\u0159ipraven\u00E9 reaktivn\u00EDm magnetronov\u00FDm napra\u0161ov\u00E1n\u00EDm"@cs . "18th International Symposium on Plasma Chemistry" . . "1"^^ . "Kyoto" . "Zeman, Petr" . "Kyoto" . . . "Si-B-C-N films; magnetron sputtering; hardness; amorphous nanostructure; oxidation resistance"@en . "362-362" . "Hou\u0161ka, Ji\u0159\u00ED" . "Pe\u0159ina, Vratislav" . "978-4-9903773-2-8" . "Nov\u00E9 kvatern\u00E1rn\u00ED Si-B-C-N vrstvy p\u0159ipraven\u00E9 reaktivn\u00EDm magnetronov\u00FDm napra\u0161ov\u00E1n\u00EDm"@cs . "RIV/49777513:23520/07:00000023" . . . . "7"^^ . "Potock\u00FD, \u0160t\u011Bp\u00E1n" . . . "Novel quaternary Si-B-C-N films prepared by reactive magnetron sputtering" . . "Novel quaternary Si-B-C-N films prepared by reactive magnetron sputtering"@en . "Vl\u010Dek, Jaroslav" . "H\u0159eben, Stanislav" .