"Evolution of film temperature during magnetron sputtering"@en . "V\u00FDvoj teploty tenk\u00E9 vrstvy b\u011Bhem magnetronov\u00E9ho napra\u0161ov\u00E1n\u00ED"@cs . "Journal of Vacuum Science and Technology A" . "Evolution of film temperature during magnetron sputtering"@en . . "23520" . "We report on the results of measurement of the temperature TFsurf which developed on the surface of films deposited by magnetron sputtering of chromium and copper targets on cooling and non-cooling silicon substrates. The TFsurf and substrate temperature (TS) were simultaneously measured using high-resolution IR camera and thermocouple, respectively. We revealed that the TFsurf steeply grows, keeps constant when it achieves saturation level, and rapidly drops to the value of the TS after stopping the deposition. At the same time, the TS either does not change for the case of cooling substrate or increases to a certain level for non-cooling substrate. However, in both cases the TS remains several times lower than the TFsurf. The TFsurf is proportional to the flux of energy delivered to the growth surface by sputtered atoms and other fast particles, weakly depends on the depositing metal and can achieve several hundreds of \u00B0C."@en . . . "Evolution of film temperature during magnetron sputtering" . . "V\u00FDvoj teploty tenk\u00E9 vrstvy b\u011Bhem magnetronov\u00E9ho napra\u0161ov\u00E1n\u00ED"@cs . . "Han, J. G." . "[A0D0E4A1E47C]" . . "RIV/49777513:23520/06:00000130!RIV07-MSM-23520___" . "US - Spojen\u00E9 st\u00E1ty americk\u00E9" . "1083" . "Musil, Jind\u0159ich" . . . . . "0" . . "Z(MSM4977751302)" . "substrate temperature; surface of the film temperature; magnetron sputtering; temperature measurement"@en . "Shaginyan, L. R." . "474835" . . "4"^^ . "We report on the results of measurement of the temperature TFsurf which developed on the surface of films deposited by magnetron sputtering of chromium and copper targets on cooling and non-cooling silicon substrates. The TFsurf and substrate temperature (TS) were simultaneously measured using high-resolution IR camera and thermocouple, respectively. We revealed that the TFsurf steeply grows, keeps constant when it achieves saturation level, and rapidly drops to the value of the TS after stopping the deposition. At the same time, the TS either does not change for the case of cooling substrate or increases to a certain level for non-cooling substrate. However, in both cases the TS remains several times lower than the TFsurf. The TFsurf is proportional to the flux of energy delivered to the growth surface by sputtered atoms and other fast particles, weakly depends on the depositing metal and can achieve several hundreds of \u00B0C." . . "RIV/49777513:23520/06:00000130" . . "Shaginyan, V. R." . "Evolution of film temperature during magnetron sputtering" . . "0734-2101" . "1"^^ . . "8"^^ . "Tento \u010Dl\u00E1nek pojedn\u00E1v\u00E1 o v\u00FDsledc\u00EDch m\u011B\u0159en\u00ED povrchov\u00E9 teploty TFsurf, kter\u00E1 vznik\u00E1 na povrchu tenk\u00E9 vrstvy deponovan\u00E9 magnetronov\u00FDm napra\u0161ov\u00E1n\u00EDm chromov\u00FDch a m\u011Bd\u011Bn\u00FDch ter\u010D\u016F na chlazen\u00E9 a nechlazen\u00E9 k\u0159em\u00EDkov\u00E9 substr\u00E1ty. Teplota TFsurf a teplota substr\u00E1tu (TS) byly simult\u00E1nn\u011B m\u011B\u0159eny IR kamerou s vysok\u00FDm rozli\u0161en\u00EDm a z\u00E1rove\u0148 termo\u010Dl\u00E1nkem. Bylo zji\u0161t\u011Bno, \u017Ee TFsurf prudce roste, dosahuje konstantn\u00EDch hodnot p\u0159i dosa\u017Een\u00ED satura\u010Dn\u00ED meze a prudce kles\u00E1 na hodnotu TS po vypnut\u00ED depozice. Sou\u010Dasn\u011B, TS se nem\u011Bn\u00ED v p\u0159\u00EDpad\u011B pou\u017Eit\u00ED chlazen\u00E9ho substr\u00E1tu nebo roste na ur\u010Ditou hodnotu v p\u0159\u00EDpad\u011B pou\u017Eit\u00ED nechlazen\u00E9ho substr\u00E1tu. P\u0159esto ov\u0161em TS dosahuje hodn"@cs .