"Structure and mechanical properties of DC magnetron sputtered Ti/Cu films" . "Struktura a mechanick\u00E9 vlastnosti vrstev TiC/Cu p\u0159ipraven\u00FDch DC magnetronov\u00FDm napra\u0161ov\u00E1n\u00EDm"@cs . . "0" . "Musil, Jind\u0159ich" . "Structure and mechanical properties of DC magnetron sputtered Ti/Cu films"@en . "Sold\u00E1n, Jan" . "Za pomoci dc nevyv\u00E1\u017Een\u00E9ho magnetronu byly v argonu nadeponov\u00E1ny nanokompozitn\u00ED TiC/Cu vrstvy z TiC ter\u010De upevn\u011Bn\u00E9ho m\u011Bd\u011Bn\u00FDm krou\u017Ekem o prom\u011Bnn\u00E9m pr\u016Fm\u011Bru. To umo\u017Enilo p\u0159ipravit vrstvy s obsahem m\u011Bdi od cca 4 do 80 at.%. Byly vy\u0161et\u0159eny korelace mezi strukturou (charakterizovanou pomoc\u00ED XRD, Raman, SEM anal\u00FDz) a mechanick\u00FDmi vlatnostmi na jedn\u00E9 stran\u011B a pou\u017Eit\u00FDmi depozi\u010Dn\u00EDmi parametry spolu s obsahem m\u011Bdi ve vrstv\u00E1ch na stran\u011B druh\u00E9. Speci\u00E1ln\u00ED \u00FAsil\u00ED bylo v\u011Bnov\u00E1no celkov\u00E9mu pnut\u00ED, parametr\u016Fm p\u0159edur\u010Duj\u00EDc\u00EDm jeho velikost a vazbu pnut\u00ED s mechanick\u00FDmi vlastnostmi. Vytvo\u0159en\u00FD TiC/Cu syst\u00E9m je porovn\u00E1n s obdobn\u00FDmi MeNx/Cu(Ni), (Me=Ti,Zr) syst\u00E9my, p\u0159i\u010Dem\u017E bylo navr\u017Eeno vysv\u011Btlen\u00ED rozd\u00EDln\u00E9ho chov\u00E1n"@cs . . . "23520" . . . "US - Spojen\u00E9 st\u00E1ty americk\u00E9" . "RIV/49777513:23520/06:00000087" . "0042-207X" . . . "Structure and mechanical properties of DC magnetron sputtered Ti/Cu films"@en . "531" . . "501963" . "[84BB142E9DF9]" . "8"^^ . "Z(MSM4977751302)" . . . "Struktura a mechanick\u00E9 vlastnosti vrstev TiC/Cu p\u0159ipraven\u00FDch DC magnetronov\u00FDm napra\u0161ov\u00E1n\u00EDm"@cs . "TiC/Cu nanocomposite films with various copper content were deposited by DC unbalanced magnetron sputtering from sintered TiC target fixed by Cu rings of different inner diameters in pure argon. This makes it possible to prepare TiC/Cu films with Cu content ranging from approximately 5 to 85 at% Cu. The structure and mechanical properties were examined as a function of deposition parameters and Cu content in the film. Special attention is devoted to the total internal stress, parameters determining its magnitude and their correlation with mechanical properties. The TiC/Cu system is compared with similar nitride MeNx/Cu(Ni) (Me=Ti,Zr) systems and explanation of the different behavior of nitride and carbide systems is proposed."@en . "2"^^ . . . . "TiC-Cu films; mechanical properties; stress; structure"@en . "Vacuum" . "TiC/Cu nanocomposite films with various copper content were deposited by DC unbalanced magnetron sputtering from sintered TiC target fixed by Cu rings of different inner diameters in pure argon. This makes it possible to prepare TiC/Cu films with Cu content ranging from approximately 5 to 85 at% Cu. The structure and mechanical properties were examined as a function of deposition parameters and Cu content in the film. Special attention is devoted to the total internal stress, parameters determining its magnitude and their correlation with mechanical properties. The TiC/Cu system is compared with similar nitride MeNx/Cu(Ni) (Me=Ti,Zr) systems and explanation of the different behavior of nitride and carbide systems is proposed." . . "RIV/49777513:23520/06:00000087!RIV07-MSM-23520___" . "2"^^ . "Structure and mechanical properties of DC magnetron sputtered Ti/Cu films" . . . .