. . "23520" . "189" . "0040-6090" . "Musil, Jind\u0159ich" . "3"^^ . . "0" . . . "10"^^ . . . . . "NL - Nizozemsko" . "Z\u00E1vislost tvrdosti na struktu\u0159e napra\u0161ovan\u00FDch Ti-Al-V-N vrstev"@cs . . "Alaart, Jan" . "Ti-Al-V-N nanostructured films; structure; hardness; chemical composition; mechanical properties; magnetron sputtering"@en . . "The paper presents a detailed analysis of structure-hardness relations in hard and superhard nanostructured Ti(Al,V)Nx films with a low content of Al(5 at.%)and V(2 at.%). The Ti(Al,V)Nx films were prepared by d.c. reactive magnetron sputtering. Special attention is devoted to the energy Epi delivered to the growing film by bombarding ions. It was found that Ti(Al,V)Nx films form a superhard material with hardness H>40 GPa; superhard Ti(Al,V)Nx films are: poly-oriented films characterized with at least two broad, low-intensity X-ray reflections, i.e. are composed of small grains of different crystallographic orientations." . "Vl\u010Dek, Jaroslav" . "Structure-hardness relations in sputtered Ti-Al-V-N films" . "[46F71A040A84]" . "Structure-hardness relations in sputtered Ti-Al-V-N films" . . "P(ME 529), Z(MSM 235200002)" . . . "629284" . "The paper presents a detailed analysis of structure-hardness relations in hard and superhard nanostructured Ti(Al,V)Nx films with a low content of Al(5 at.%)and V(2 at.%). The Ti(Al,V)Nx films were prepared by d.c. reactive magnetron sputtering. Special attention is devoted to the energy Epi delivered to the growing film by bombarding ions. It was found that Ti(Al,V)Nx films form a superhard material with hardness H>40 GPa; superhard Ti(Al,V)Nx films are: poly-oriented films characterized with at least two broad, low-intensity X-ray reflections, i.e. are composed of small grains of different crystallographic orientations."@en . "Structure-hardness relations in sputtered Ti-Al-V-N films"@en . . . . "Structure-hardness relations in sputtered Ti-Al-V-N films"@en . . "Mitterer, Christian" . "Z\u00E1vislost tvrdosti na struktu\u0159e napra\u0161ovan\u00FDch Ti-Al-V-N vrstev"@cs . . "RIV/49777513:23520/03:00000090" . . "RIV/49777513:23520/03:00000090!RIV07-MSM-23520___" . . "\u010Cl\u00E1nek p\u0159edstavuje detailn\u00ED anal\u00FDzu z\u00E1vislosti tvrdosti na struktu\u0159e napra\u0161ovan\u00FDch tvrd\u00FDch a supertvrd\u00FDch nanostrukturn\u00EDch Ti(Al,V)Nx vrstev. D\u016Fle\u017Eit\u00FDm faktorem nutn\u00FDm pro tvorbu supertvrd\u00FDch vrstev byla energie dodan\u00E1 vrstv\u011B dopadaj\u00EDc\u00EDmi ionty Epi. Vytvo\u0159en\u00E9 vrstvy m\u011Bly tvrdost H  40 GPa, n\u00EDzk\u00E9 tlakov\u00E9 pnut\u00ED  ≤ -2 GPa a byly vytvo\u0159eny p\u0159i celkov\u00E9m tlaku pT = 0.5 Pa a energii Epi  0.5 MJ/cm3. Bylo uk\u00E1z\u00E1no, \u017Ee supertvrd\u00FD nanostrukturn\u00ED materi\u00E1l m\u016F\u017Ee b\u00FDt tvo\u0159en zrny jednoho materi\u00E1lu s r\u016Fznou krystalografickou orientac\u00ED."@cs . "5"^^ . "Thin Solid Films" . . "Pol\u00E1kov\u00E1, Helena" .