"2003-01-13+01:00"^^ . . . "Characterization of pulsed dc magnetron sputtering plasmas using time-resolved optical emission spectroscopy"@en . . . "Pajdarov\u00E1, Andrea Dag" . . "Proceedings of the XIVth Symposium on Application of Plasma Processes" . . "Le\u0161tina, Jan" . . . "RIV/49777513:23520/03:00000042" . "Military Academy" . "124-125" . "Characterization of pulsed dc magnetron sputtering plasmas using time-resolved optical emission spectroscopy" . "Vl\u010Dek, Jaroslav" . . . . . "RIV/49777513:23520/03:00000042!RIV/2004/MSM/235204/N" . "Characterization of pulsed dc magnetron sputtering plasmas using time-resolved optical emission spectroscopy"@en . "600951" . "Z(MSM 235200002)" . "5"^^ . "Characterization of pulsed dc magnetron sputtering plasmas using time-resolved optical emission spectroscopy" . . "B\u011Blsk\u00FD, Petr" . "Musil, Jind\u0159ich" . "Pulsed dc magnetron sputtering gives us new possibilities in deposition processes, because it allows to form films under new physical conditions, e.g. at high deposition rates, at highly ionized fluxes of sputtered particles and at a possible simultaneo usputtering and evaporation of a target. The aim of this work is to investigate the relative densities of argon (working gas) atoms and ions, and copper (target) atoms and ions in front of a sputtered target during voltage pulses and in pauses between them." . . "5"^^ . "[670E9C4E4149]" . "80-8040-195-0" . "23520" . "Liptovsk\u00FD Mikul\u00E1\u0161" . . "Liptovsk\u00FD Mikul\u00E1\u0161" . . "Pulsed dc magnetron sputtering gives us new possibilities in deposition processes, because it allows to form films under new physical conditions, e.g. at high deposition rates, at highly ionized fluxes of sputtered particles and at a possible simultaneo usputtering and evaporation of a target. The aim of this work is to investigate the relative densities of argon (working gas) atoms and ions, and copper (target) atoms and ions in front of a sputtered target during voltage pulses and in pauses between them."@en . "pulsed magnetron sputtering;optical emission spectroscopy"@en . "2"^^ . . . . "0"^^ . "0"^^ .