"0" . . "23520" . "0040-6090" . "Regent, F." . . . "Thin Solid Films" . . "Composion, structure, microhardness and residual stress of W-Ti-N films deposited by reactive magnetron sputtering" . "Musil, Jind\u0159ich" . . . "Composion, structure, microhardness and residual stress of W-Ti-N films deposited by reactive magnetron sputtering"@en . . "Composion, structure, microhardness and residual stress of W-Ti-N films deposited by reactive magnetron sputtering" . "641431" . "Zemek, Josef" . "Vrstvy W-Ti-N byly deponov\u00E1ny technikou reaktivn\u00ED DC magnetronov\u00E9 depozice. Krystalov\u00E1 struktura, mikrostruktura, slo\u017Een\u00ED, tvrdost a zbytkov0 pnut\u00ED byly studov\u00E1ny jako funkce parci\u00E1ln\u00EDho tlaku dus\u00EDku. Tyto vrstvy vykazuj\u00ED tvrdost v rozsahu od 25 GPa ( [N]= 0) a\u017E do 63 GPa ([N]=25 at.% ) a zbytkov\u00E9 pnut\u00ED v rozsahu od -1.3 GPa a\u017E do -5.7 GPa. Nejv\u011Bt\u0161\u00ED tvrdost byla nalezena ve vrstv\u00E1ch, kter\u00E9 spl\u0148ovaly n\u00E1sleduj\u00EDc\u00ED podm\u00EDnky: (i) p\u0159\u00EDtomnost dvou krystalick\u00FDch f\u00E1z\u00ED, (ii) velk\u00E9 mikropnut\u00ED , a (iii) relativn\u011B n\u00EDzk\u00E9 tlakov\u00E9 zbytkov\u00E9 pnut\u00ED."@cs . "RIV/49777513:23520/02:00000091!RIV07-MSM-23520___" . "NL - Nizozemsko" . "Z(MSM 235200002)" . "1"^^ . "Slo\u017Een\u00ED, struktura, mikrotvrdost a zbytkov\u00E9 pnut\u00ED W-Ti-N vrstev deponovan\u00FDch reaktivn\u00EDm magnetronov\u00FDm napra\u0161ov\u00E1n\u00EDm"@cs . . "W-Ti-N films were deposited by reactive DC magnetron sputtering from a W-Ti (30 at.%) target, in a mixture of argon and nitrogen at a total pressure of 0.5 Pa, onto steel and silicon substrates. The crystal structure, microstructure, composition, micro-hardness and residual stress were studied as a function of the partial pressure of nitrogen. The microhardness of the W-Ti-N films increased with increasing nitrogen concentration from 25 GPa for [N] = 0 up to a maximum of approximately 65 GPa at [N] = 25 at.%. The maximum microhardness was found in films that simultaneously possessed: 1.the presence of two crystalline phases; 2.large microstrain; and 3.relatively low compressive residual stress."@en . . "W-Ti-N films were deposited by reactive DC magnetron sputtering from a W-Ti (30 at.%) target, in a mixture of argon and nitrogen at a total pressure of 0.5 Pa, onto steel and silicon substrates. The crystal structure, microstructure, composition, micro-hardness and residual stress were studied as a function of the partial pressure of nitrogen. The microhardness of the W-Ti-N films increased with increasing nitrogen concentration from 25 GPa for [N] = 0 up to a maximum of approximately 65 GPa at [N] = 25 at.%. The maximum microhardness was found in films that simultaneously possessed: 1.the presence of two crystalline phases; 2.large microstrain; and 3.relatively low compressive residual stress." . "12"^^ . . "6"^^ . . "Composion, structure, microhardness and residual stress of W-Ti-N films deposited by reactive magnetron sputtering"@en . "Mi\u0161ina, Martin" . . . "Slo\u017Een\u00ED, struktura, mikrotvrdost a zbytkov\u00E9 pnut\u00ED W-Ti-N vrstev deponovan\u00FDch reaktivn\u00EDm magnetronov\u00FDm napra\u0161ov\u00E1n\u00EDm"@cs . "Shaginyan, L. R." . . "136" . "[429C6771AF00]" . "Britun, V. F." . . "hardness; sputtering; nitrides; alloys"@en . . "RIV/49777513:23520/02:00000091" .