"Pavl\u00EDk, Jaroslav" . "Properties of Magnetron Deposited Variable Fe Doped SnO2 Thin Films for Gas"@en . "The Fe doped SnO2 thin films for gas sensors applications were deposited by RF magnetron cosputtering of SnO2 and Fe dopand using a single sputter target with a variable SnO2/Fe ratio in the argon gas. The coatings were deposited in two different off-axis positions. The first position, the angle between planes of the substrate and target was 30o from parallel plane where the upside of substrate was toward to the target to allow shadowing effects. The second position was selected to reduce a higher energy ion bombardment on the growing film by positioning substrate perpendicular to target. The surface morphology of the films was controlled from very smooth up to orange-peel like structure simply by RF power and the position of substrates. The Fe content in coating was tunable in wide range by adjusting Fe ratio on the target and by variation of RF power. The Fe content was evaluated from XPS spectra by deconvolution of two overlapped peaks Sn 3p and Fe 2p and from RBS. Beam of He+ ions 2.0 MeV was used" . . "337169" . . . . . . . . "978-80-89186-46-4" . "Comenius University in Bratislava; Humboldt-Club Slovakia Bratislava" . "Malinsk\u00FD, Petr" . "Bratislava, Slovakia" . . . "Book of Contributed Papers of 17th Symposium on Application of Plasma Processe- Visegrad Workshop on Research of Plasma Physics" . "13440" . "Properties of Magnetron Deposited Variable Fe Doped SnO2 Thin Films for Gas"@en . . "Liptovsk\u00FD J\u00E1n, Slovakia" . "Properties of Magnetron Deposited Variable Fe Doped SnO2 Thin Films for Gas" . . "3"^^ . "Kormunda, Martin" . "RIV/44555601:13440/09:00004869" . "Properties of Magnetron Deposited Variable Fe Doped SnO2 Thin Films for Gas" . "2009-01-17+01:00"^^ . . "RIV/44555601:13440/09:00004869!RIV10-MSM-13440___" . "2"^^ . "P(KAN400720701), P(LC06041)" . "Fe doped SnO2 thin films; gas sensors; RF magnetron sputtering; XPS; RBS"@en . "[1A09CC207C2F]" . . "3"^^ . . . . . . . . "The Fe doped SnO2 thin films for gas sensors applications were deposited by RF magnetron cosputtering of SnO2 and Fe dopand using a single sputter target with a variable SnO2/Fe ratio in the argon gas. The coatings were deposited in two different off-axis positions. The first position, the angle between planes of the substrate and target was 30o from parallel plane where the upside of substrate was toward to the target to allow shadowing effects. The second position was selected to reduce a higher energy ion bombardment on the growing film by positioning substrate perpendicular to target. The surface morphology of the films was controlled from very smooth up to orange-peel like structure simply by RF power and the position of substrates. The Fe content in coating was tunable in wide range by adjusting Fe ratio on the target and by variation of RF power. The Fe content was evaluated from XPS spectra by deconvolution of two overlapped peaks Sn 3p and Fe 2p and from RBS. Beam of He+ ions 2.0 MeV was used"@en .