. "1143-1146" . . "[3C8D9FC93BB7]" . . . "4"^^ . "The combined study of the organosilicon films by RBS, ERDA and AFM analytical methods obtained from PECVD and PACVD" . "Komplexn\u00ED studium vrstev p\u0159ipraven\u00FDch metodami PECVD a PACVD analytick\u00FDmi metodami RBS, ERDA a AFM."@cs . "566-568" . "The combined study of the organosilicon films by RBS, ERDA and AFM analytical methods obtained from PECVD and PACVD"@en . "4"^^ . "Granier, A." . . . "\u0160vec, Martin" . . . "Pe\u0159ina, V\u00E1clav" . "Mackov\u00E1, Anna" . "The combined study of the organosilicon films by RBS, ERDA and AFM analytical methods obtained from PECVD and PACVD"@en . "Organosilicon plasma deposited polymers are of interest for different kinds of applications like packaging, passivation and dielectric layers. A large set of plasma processes is possible, among which are low-pressure plasma enhanced chemical vapour deposition (PECVD) and plasma assisted chemical vapour deposition (PACVD) often used. In this work, we studied the composition and surface morphology of the hexamethyldisiloxane (HMDSO) and tetramethyldisoloxane (TMDSO) layers produced by PECVD and PACVD deposition using three plasma generation processes (plasma reactors): RF inductively coupled plasma (RFICP), microwave distributed electron cyclotron resonance plasma (DECR) and microwave induced remote nitrogen afterlow (MIRA). The layers composition was investigated by Rutherford backscattering spectrometry (RBS) and by elastic recoil detection analysis (ERDA) and the layer surface morphology was determined by atomic force microscopy (AFM). Composition, density and morphology (roughness, porosity) of the"@en . . "RIV/44555601:13430/04:00002694!RIV/2005/MSM/134305/N" . "RIV/44555601:13430/04:00002694" . . "Str\u00FDhal, Zden\u011Bk" . . "Organosilicon plasma deposited polymers are of interest for different kinds of applications like packaging, passivation and dielectric layers. A large set of plasma processes is possible, among which are low-pressure plasma enhanced chemical vapour deposition (PECVD) and plasma assisted chemical vapour deposition (PACVD) often used. In this work, we studied the composition and surface morphology of the hexamethyldisiloxane (HMDSO) and tetramethyldisoloxane (TMDSO) layers produced by PECVD and PACVD deposition using three plasma generation processes (plasma reactors): RF inductively coupled plasma (RFICP), microwave distributed electron cyclotron resonance plasma (DECR) and microwave induced remote nitrogen afterlow (MIRA). The layers composition was investigated by Rutherford backscattering spectrometry (RBS) and by elastic recoil detection analysis (ERDA) and the layer surface morphology was determined by atomic force microscopy (AFM). Composition, density and morphology (roughness, porosity) of the" . "Pavl\u00EDk, Jaroslav" . . "Byla zkoum\u00E1na role parametr\u016F b\u011Bhem depozice p\u0159edev\u0161\u00EDm teploty substr\u00E1tu na r\u016Fst k\u0159em\u00EDkov\u00FDch vrstev. Druh\u00E1 \u010D\u00E1st prezentovan\u00FDch v\u00FDsledk\u016F se t\u00FDkala studia morfologie a slo\u017Een\u00ED vrstev p\u0159ipraven\u00FDch n\u011Bkolika typy plasmatick\u00FDch reaktor\u016F. Vrstvy byly studov\u00E1ny jadern\u00FDmi analytick\u00FDmi metodami RBS, ERDA a rovn\u011B\u017E AFM. Morfologie, slo\u017Een\u00ED vrstev a jejich vlastnosti byly diskutov\u00E1ny ve spojitosti s\u00A0pou\u017Eit\u00EDm r\u016Fzn\u00FDch typ\u016F plasmatick\u00FDch reaktor\u016F."@cs . "0039-6028" . . "10"^^ . "Quede, A." . "558094" . . "silicon;ion scattering spectroscopy;chemical vapour deposition;plasma processing"@en . "Surface Science" . "NL - Nizozemsko" . . . "2" . "Borvon, G." . "Raynaud, P." . "P(OC 527.50)" . . . "Komplexn\u00ED studium vrstev p\u0159ipraven\u00FDch metodami PECVD a PACVD analytick\u00FDmi metodami RBS, ERDA a AFM."@cs . "Supiot, P." . . "The combined study of the organosilicon films by RBS, ERDA and AFM analytical methods obtained from PECVD and PACVD" . "13430" .