. . "Le Vide: science, technique et application" . "The surface structure features of Al2O3 thin films, which were prepared by plasma oxidation of aluminium thin films, were observed using atomic force microscopy (AFM). The alumina thin films were prepared at different sample bias voltages for demonstration of the preparation condition influence. It was found that the value of sample bias voltage plays an indispensable role for surface structure of the alumina film. Structural properties of the Al2O3 films could be affected during preparation due to plasma particle bombardment. The thickness of Al, Al-Al2O3, and Al-Al2O3-Al structures was derived from the AFM images of surfaces with a mechanical scratch." . "AFM Study of Al2O3 Thin Films Prepared by Plasma Oxidation"@en . . "3"^^ . . "[298E7A69823B]" . "1266-0167" . . "Str\u00FDhal, Zden\u011Bk" . "The surface structure features of Al2O3 thin films, which were prepared by plasma oxidation of aluminium thin films, were observed using atomic force microscopy (AFM). The alumina thin films were prepared at different sample bias voltages for demonstration of the preparation condition influence. It was found that the value of sample bias voltage plays an indispensable role for surface structure of the alumina film. Structural properties of the Al2O3 films could be affected during preparation due to plasma particle bombardment. The thickness of Al, Al-Al2O3, and Al-Al2O3-Al structures was derived from the AFM images of surfaces with a mechanical scratch."@en . "Pavl\u00EDk, Jaroslav" . "3"^^ . "Nov\u00E1k, Stanislav" . "3"^^ . "390" . . . "RIV/44555601:13430/00:00000560!RIV/2001/MSM/134301/N" . "Pavl\u00EDk, Jaroslav" . "704049" . "AFM Study of Al2O3 Thin Films Prepared by Plasma Oxidation" . "Str\u00FDhal, Zden\u011Bk" . . . "AFM Study of Al2O3 Thin Films Prepared by Plasma Oxidation" . "RIV/44555601:13430/00:00000560" . "Nov\u00E1k, Stanislav" . . "neuveden" . "P(OC 527.50), Z(MSM 134300001)" . . "13430" . . . "AFM Study of Al2O3 Thin Films Prepared by Plasma Oxidation"@en . "295" .