"7"^^ . "173458" . "The plasma PECVD technology was developed for the deposition of ZnO thin films doped by Al. Microwave plasma jet generated by a surface wave is employed for this purpose. If the deposition conditions are controlled, It is possible to achieve defined sizes of crystallites, defined electrical conductivity and film thickeness."@en . . "Technologick\u00FD postup p\u0159\u00EDpravy ZnO vrstev MW PECVD metodou s definovanou vodivosti a velikosti zrna" . . . . "Technologick\u00FD postup p\u0159\u00EDpravy ZnO vrstev MW PECVD metodou s definovanou vodivosti a velikosti zrna"@cs . . "Technology of ZnO films preparation by MW PECVD with defined conductivity and grain size"@en . "RIV/27711170:_____/12:#0000019" . "Technologick\u00FD postup p\u0159\u00EDpravy ZnO vrstev MW PECVD metodou s definovanou vodivosti a velikosti zrna" . "2"^^ . "\u010Cada, Martin" . . "deposition; plasma; MWPECVD technology; thin films"@en . "RIV/27711170:_____/12:#0000019!RIV13-TA0-27711170" . "MWZnO-2012-01" . . . "Potock\u00FD, \u0160t\u011Bp\u00E1n" . . . "Pitrun, Ji\u0159\u00ED" . "SVCS Process Innovation s.r.o." . . "2012-12-13+01:00"^^ . "[1C7EF206D9F1]" . . "Hubi\u010Dka, Zden\u011Bk" . "\u0160m\u00EDd, Ji\u0159\u00ED" . "Kromka, Alexander" . "Byla vyvinuta plazmov\u00E1 PECVD technologie pripravy tenkych vrstev ZnO dopovanych Al v mikrovlnnem vyboji s povrchovou vlnou a plazmov\u00FDm proud\u00EDc\u00EDm kan\u00E1lem. Pomoc\u00ED tohoto technologickeho postupu lze kontrolou podm\u00EDnek p\u0159i procesu dos\u00E1hnout definovan\u00E9 velikosti krystalick\u00E9ho zrna, elektrick\u00E9 vodivosti vrstvy a jej\u00ED tlou\u0161\u0165ky" . . . . . "Technologick\u00FD postup p\u0159\u00EDpravy ZnO vrstev MW PECVD metodou s definovanou vodivosti a velikosti zrna"@cs . "Byla vyvinuta plazmov\u00E1 PECVD technologie pripravy tenkych vrstev ZnO dopovanych Al v mikrovlnnem vyboji s povrchovou vlnou a plazmov\u00FDm proud\u00EDc\u00EDm kan\u00E1lem. Pomoc\u00ED tohoto technologickeho postupu lze kontrolou podm\u00EDnek p\u0159i procesu dos\u00E1hnout definovan\u00E9 velikosti krystalick\u00E9ho zrna, elektrick\u00E9 vodivosti vrstvy a jej\u00ED tlou\u0161\u0165ky."@cs . "Technology of ZnO films preparation by MW PECVD with defined conductivity and grain size"@en . "P(TA01011740)" . . "A-MWZnO-2012-01" . "Metodika bude slou\u017Eit jako podp\u016Frn\u00FD produkt prodeje MWPECVD za\u0159\u00EDzen\u00ED. V r\u00E1mci implementace certifikovan\u00E9 metodiky do zm\u00EDn\u011Bn\u00E9ho MWPECVD za\u0159\u00EDzen\u00ED o\u010Dek\u00E1v\u00E1me nav\u00FD\u0161en\u00ED ceny tohoto za\u0159\u00EDzen\u00ED cca o 4%." . "Pij\u00E1k, Anton\u00EDn" . "Byla vyvinuta plazmov\u00E1 PECVD technologie pripravy tenkych vrstev ZnO dopovanych Al v mikrovlnnem vyboji s povrchovou vlnou a plazmov\u00FDm proud\u00EDc\u00EDm kan\u00E1lem. Pomoc\u00ED tohoto technologickeho postupu lze kontrolou podm\u00EDnek p\u0159i procesu dos\u00E1hnout definovan\u00E9 velikosti krystalick\u00E9ho zrna, elektrick\u00E9 vodivosti vrstvy a jej\u00ED tlou\u0161\u0165ky." . .