"Ov\u011B\u0159en\u00E1 technologie funk\u010Dnosti prototypu za\u0159\u00EDzen\u00ED pro vysokoteplotn\u00ED suchou a mokrou oxidaci na struktur\u00E1ch k\u0159em\u00EDkov\u00FDch sol\u00E1rn\u00EDch \u010Dl\u00E1nk\u016F" . "SVOXI_SOL_1" . "Poruba, Ale\u0161" . "P(TA01020972)" . "Pij\u00E1k, Anton\u00EDn" . "Jake\u0161, Jakub" . . . . "Mare\u0161, Gustav" . . "Fiala, Martin" . "9"^^ . "Ov\u011B\u0159en\u00ED mo\u017Enosti jednotn\u00E9ho designu pec\u00ED pro suchou a vlhkou oxidaci Si desek. Ov\u011B\u0159en\u00ED kvality (pasiva\u010Dn\u00EDch vlastnost\u00ED pro n-typov\u00E9 i p-typov\u00E9 povrchy) a rychlosti r\u016Fstu oxidov\u00FDch vrstev v z\u00E1vislosti na teplot\u011B, \u00FArovni povrchov\u00E9 koncentrace dopant\u016F a \u0159ed\u011Bn\u00ED koncentrace vodn\u00ED p\u00E1ry v reaktoru p\u0159id\u00E1n\u00EDm dus\u00EDku a kysl\u00EDku. Ov\u011B\u0159en\u00ED vlivu r\u016Fstov\u00FDch parametr\u016F SiO2 vrstvy na v\u00FDsledn\u00E9 optick\u00E9 a elektrick\u00E9 vlastnosti testovac\u00EDch sol\u00E1rn\u00EDch \u010Dl\u00E1nk\u016F. Ov\u011B\u0159en\u00ED pou\u017Eit\u00ED designu dvojvrstv\u00E9 ARC pasiva\u010Dn\u00ED vrstvy s tlou\u0161\u0165kou 25 a\u017E 30 nm (ve spojen\u00ED s dal\u0161\u00ED tenkou vrstvou na b\u00E1zi Si3N4 s tlou\u0161\u0165kou 40 a\u017E 50 nm) v procesu v\u00FDroby sol\u00E1rn\u00EDch \u010Dl\u00E1nk\u016F s vysokou \u00FA\u010Dinnost\u00ED." . . "18"^^ . . . . "Mart\u00EDnek, Pavel" . "Wostr\u00FD, Petr" . "Verified technology of functionallity of reactor prototype for hightemperature wet and dry oxidation at silicon solar cells structures."@en . . . "Ov\u011B\u0159en\u00E1 technologie funk\u010Dnosti prototypu za\u0159\u00EDzen\u00ED pro vysokoteplotn\u00ED suchou a mokrou oxidaci na struktur\u00E1ch k\u0159em\u00EDkov\u00FDch sol\u00E1rn\u00EDch \u010Dl\u00E1nk\u016F" . "Frant\u00EDk, Ond\u0159ej" . "Ov\u011B\u0159en\u00E1 technologie funk\u010Dnosti prototypu za\u0159\u00EDzen\u00ED pro vysokoteplotn\u00ED suchou a mokrou oxidaci na struktur\u00E1ch k\u0159em\u00EDkov\u00FDch sol\u00E1rn\u00EDch \u010Dl\u00E1nk\u016F"@cs . "Pitrun, Ji\u0159\u00ED" . . "V p\u0159\u00EDpad\u011B implementace ov\u011B\u0159en\u00E9 technolopie pro vysokoteplotn\u00ED suchou a mokrou oxidaci na struktur\u00E1ch k\u0159em\u00EDkov\u00FDch sol\u00E1rn\u00EDch \u010Dl\u00E1nk\u016F do vysokoteplotn\u00EDch pec\u00ED SVFur spole\u010Dn\u011B s metodikami pro p\u0159\u00EDpravu substr\u00E1t\u016F a vytv\u00E1\u0159en\u00ED t\u011Bchto vrstev se p\u0159edpokl\u00E1d\u00E1 7% n\u00E1r\u016Fst prodeje v segmentu oxida\u010Dn\u00EDch reaktor\u016F spole\u010Dnost\u00ED SVCS Process Innovation s.r.o." . . . . "Kone\u010Dn\u00FD, Ladislav" . . "Ov\u011B\u0159en\u00E1 technologie such\u00E9 a vlhk\u00E9 oxidace 5-ti a 6-ti palcov\u00FDch Si desek pro dosa\u017Een\u00ED homogenity po\u017Eadovan\u00E9 tlou\u0161\u0165ky vrstvy SiO2 po plo\u0161e jednotliv\u00FDch desek v cel\u00E9 zpracov\u00E1van\u00E9 d\u00E1vce zahrnuje tak\u00E9 ov\u011B\u0159en\u00ED pou\u017Eit\u00ED designu dvouvrstv\u00E9 ARC pasiva\u010Dn\u00ED vrstvy s tlou\u0161\u0165kou 25 a\u017E 30 nm v procesu v\u00FDroby sol\u00E1rn\u00EDch \u010Dl\u00E1nk\u016F s vysokou \u00FA\u010Dinnost\u00ED." . . "Holovsk\u00FD, Jakub" . "[EE0D83E76E80]" . . . . "Verified technology of functionallity of reactor prototype for hightemperature wet and dry oxidation at silicon solar cells structures."@en . "Ba\u0159inka, Radim" . "157388" . . "Rek, \u0160t\u011Bp\u00E1n" . "Ov\u011B\u0159en\u00E1 technologie such\u00E9 a vlhk\u00E9 oxidace 5-ti a 6-ti palcov\u00FDch Si desek pro dosa\u017Een\u00ED homogenity po\u017Eadovan\u00E9 tlou\u0161\u0165ky vrstvy SiO2 po plo\u0161e jednotliv\u00FDch desek v cel\u00E9 zpracov\u00E1van\u00E9 d\u00E1vce zahrnuje tak\u00E9 ov\u011B\u0159en\u00ED pou\u017Eit\u00ED designu dvouvrstv\u00E9 ARC pasiva\u010Dn\u00ED vrstvy s tlou\u0161\u0165kou 25 a\u017E 30 nm v procesu v\u00FDroby sol\u00E1rn\u00EDch \u010Dl\u00E1nk\u016F s vysokou \u00FA\u010Dinnost\u00ED."@cs . "Purkrt, Adam" . "\u010Cech, Pavel" . "\u0160t\u011Bp\u00E1nek, Jaroslav" . "Verified technology of dry and wet oxidation of 5 and 6 inched Si wafers for achieving uniformity of required thickness of SiO2 layer at wafers surfarce in whole dose comprises a verification of using a design of double layerd antireflexive pasivation layer with thickness from 25 to 30 nm in process of manufacturing solar cells of high efficiency."@en . "Ba\u0159inkov\u00E1, Pavl\u00EDna" . "RIV/27711170:_____/12:#0000004!RIV13-TA0-27711170" . "high temperature silicon oxide layer formation"@en . "Ov\u011B\u0159en\u00E1 technologie funk\u010Dnosti prototypu za\u0159\u00EDzen\u00ED pro vysokoteplotn\u00ED suchou a mokrou oxidaci na struktur\u00E1ch k\u0159em\u00EDkov\u00FDch sol\u00E1rn\u00EDch \u010Dl\u00E1nk\u016F"@cs . . "RIV/27711170:_____/12:#0000004" . "Reme\u0161, Zden\u011Bk" . . . . . .