. "Advanced Silicon Wafer"@en . "Lorenc, Michal" . . . "CZ2" . "Pokro\u010Dil\u00E1 k\u0159em\u00EDkov\u00E1 deska"@cs . . "\u0160ik, Jan" . . . "Pokro\u010Dil\u00E1 k\u0159em\u00EDkov\u00E1 deska" . . . "RIV/26821532:_____/08:#0000012!RIV08-MPO-26821532" . . "Pokro\u010Dil\u00E1 k\u0159em\u00EDkov\u00E1 deska"@cs . . . "387212" . "Pokro\u010Dil\u00E1 k\u0159em\u00EDkov\u00E1 deska" . "Advanced Silicon Wafer"@en . . . . . "Advanced Silicon Wafer (ASIW) for sub-micron applications - specified sample, manufacturing technology - single wafer grinding and polishing and crystal growth method."@en . "+1700 ASiW/t\u00FDden, +40 mil.CZK/rok" . "Pokro\u010Dil\u00E1 k\u0159em\u00EDkov\u00E1 deska pro sub-mikronov\u00E9 technologie - funk\u010Dn\u00ED vzorek a technologie v\u00FDroby, p\u0159edev\u0161\u00EDm jednodeskov\u00E9 brou\u0161en\u00ED a jednodeskov\u00E9 le\u0161t\u011Bn\u00ED a zp\u016Fsob r\u016Fstu krystalu."@cs . . . "TIR, TTV max. 1um, BOW max .10um, WARP max. 10um, OISF max .5 cm-2" . "ASiW" . . . "RIV/26821532:_____/08:#0000012" . "Pokro\u010Dil\u00E1 k\u0159em\u00EDkov\u00E1 deska pro sub-mikronov\u00E9 technologie - funk\u010Dn\u00ED vzorek a technologie v\u00FDroby, p\u0159edev\u0161\u00EDm jednodeskov\u00E9 brou\u0161en\u00ED a jednodeskov\u00E9 le\u0161t\u011Bn\u00ED a zp\u016Fsob r\u016Fstu krystalu." . "Silicon, Wafer, Crystal, Czochralski, Grinding, Polishing"@en . . "P(FI-IM2/131)" . . "2"^^ . "[DC369FCA91A8]" . "2"^^ . . .