"1"^^ . "Zdroj organick\u00FDch molekul s t\u0159emi segmenty"@cs . . "Za\u0159\u00EDzen\u00ED je ur\u010Deno k depozici organick\u00FDch tenk\u00FDch vrstev v podm\u00EDnk\u00E1ch vysok\u00E9ho vakua od p>1x10-5Pa. Za\u0159\u00EDzen\u00ED obsahuje t\u0159i napa\u0159ovac\u00ED segment \u010D\u00E1sti umo\u017E\u0148uj\u00EDc\u00ED depozici multi vrstevnatvnat\u00FDch struktur. Oh\u0159ev depozitu je v rozmez\u00ED teplot (20oC-350oC). T\u011Blo zdroje je zhotoveno s F.O.Cu. a \u00FA\u010Dinn\u011B chlazeno vodou. Depozit je um\u00EDst\u011Bn v PBN z\u00E1sobn\u00EDku. Cel\u00E9 za\u0159\u00EDzen\u00ED je um\u00EDst\u011Bno na p\u0159\u00EDrub\u011B DN40." . . "[D22D42D9B31D]" . "http://surfaces.fme.vutbr.cz/laboratories/developed-instruments/2014-03/" . . "RIV/00216305:26620/14:PR28108" . . "Zdroj organick\u00FDch molekul s t\u0159emi segmenty" . . "Three segment ogranic molecule evaporation source"@en . . "Organick\u00E1 cela" . "P(TE01020233)" . . "Organic molecules, organic semiconductors, effusion cell, ultrathin layers, UHV, deposition"@en . . . . . . . "N\u00E1klady na v\u00FDrobu byly 150 000K\u010D. Doba v\u00FDvoje za\u0159\u00EDzen\u00ED p\u0159es\u00E1hla n\u011Bkolik set hodin. Za\u0159\u00EDzen\u00ED je vyu\u017E\u00EDv\u00E1no ke studiu r\u016Fstu organick\u00FDch polovodi\u010Dov\u00FDch tenk\u00FDch vrstev v UHV. D\u00E1le bude u\u017E\u00EDv\u00E1no ke studiu tvorby organick\u00FDch uspo\u0159\u00E1dan\u00FDch s\u00ED\u0165ov\u00FDch syst\u00E9m\u016F." . . . "26620" . . . "Mach, Jind\u0159ich" . "Za\u0159\u00EDzen\u00ED je ur\u010Deno pro depozici ultratenk\u00FDch organick\u00FDch vrstev v podm\u00EDnk\u00E1ch UHV. Organick\u00E9 materi\u00E1ly lze um\u00EDstit do jednoho ze t\u0159\u00ED PBN z\u00E1sobn\u00EDk\u016F. Pracovn\u00ED teplotu z\u00E1sobn\u00EDk\u016F lze nez\u00E1visle nastavit v rozmez\u00ED teplot od 20 C a\u017E do 350 C. Tato teplota je sn\u00EDm\u00E1na pomoc\u00ED termo\u010Dl\u00E1nk\u016F. Rychlej\u0161\u00ED reak\u010Dn\u00ED doba oh\u0159evu mezi PBN z\u00E1sobn\u00EDkem a Cu topn\u00FDm t\u011Blesem je realizov\u00E1na tenkou vrstvou tekut\u00E9ho kovov\u00E9ho materi\u00E1lu (indium)."@cs . "Zdroj organick\u00FDch molekul s t\u0159emi segmenty"@cs . . "57234" . . . "RIV/00216305:26620/14:PR28108!RIV15-TA0-26620___" . . "1"^^ . "Za\u0159\u00EDzen\u00ED je ur\u010Deno pro depozici ultratenk\u00FDch organick\u00FDch vrstev v podm\u00EDnk\u00E1ch UHV. Organick\u00E9 materi\u00E1ly lze um\u00EDstit do jednoho ze t\u0159\u00ED PBN z\u00E1sobn\u00EDk\u016F. Pracovn\u00ED teplotu z\u00E1sobn\u00EDk\u016F lze nez\u00E1visle nastavit v rozmez\u00ED teplot od 20 C a\u017E do 350 C. Tato teplota je sn\u00EDm\u00E1na pomoc\u00ED termo\u010Dl\u00E1nk\u016F. Rychlej\u0161\u00ED reak\u010Dn\u00ED doba oh\u0159evu mezi PBN z\u00E1sobn\u00EDkem a Cu topn\u00FDm t\u011Blesem je realizov\u00E1na tenkou vrstvou tekut\u00E9ho kovov\u00E9ho materi\u00E1lu (indium)." . "Zdroj organick\u00FDch molekul s t\u0159emi segmenty" . "The device serves for deposition of ultrathin organic layers under UHV conditions. Organic material for evaporation is placed in one of three PBN crucibles which can be operated independently. The operation temperature in range 20 \u2013 350 C is controlled by thermocouple. The faster heat transfer between PBN and Cu heater is mediated by liquid metal (In) filling."@en . "Three segment ogranic molecule evaporation source"@en . .