. "Hoferek, Luk\u00E1\u0161" . . . "[2B1CF368C7BC]" . "\u010Cech, Vladim\u00EDr" . . . "RIV/00216305:26310/14:PU113720!RIV15-TA0-26310___" . . "Monomer deficient conditions used to control physical properties of plasma polymer films in wide ranges by RF power" . "P(GCP205/12/J058), P(TA01010796)" . "Trivedi, Rutul Rajendra" . "thin films, plasma polymerization, optical properties, mechanical properties"@en . . . "RIV/00216305:26310/14:PU113720" . "Kont\u00E1rov\u00E1, So\u0148a" . "Monomer deficient conditions used to control physical properties of plasma polymer films in wide ranges by RF power"@en . . . "Monomer deficient conditions used to control physical properties of plasma polymer films in wide ranges by RF power" . "We found out that the monomer deficient conditions enable to control mechanical and optical properties of plasma polymer films by RF power using plasma-enhanced chemical vapor deposition. The monomer deficient conditions may be characterized by the plasma process pressure (plasma switched on) lower than the basic process pressure (plasma switched off), which means that the concentration of reactive species is not insignificant or is even comparable with the concentration of monomer molecules. The monomer deficient conditions are achieved at lower monomer flow rates (0.5-10 sccm) operated at lower basic process pressures (1-5 Pa). In this study, we plasma polymerized tetravinylsilane at a mass flow rate of 3.8sccm operated at a basic process pressure of 3.0 Pa, and RF power ranging 10-70 W using continuous wave. The plasma process pressure decreased from 1.7 Pa (10 W) to 1.1 Pa (70 W) at enhanced power. The plasma species were monitored by mass spectrometry and correlated with chemical properties of de"@en . "Trivedi, Rutul Rajendra" . . "4"^^ . . "Monomer deficient conditions used to control physical properties of plasma polymer films in wide ranges by RF power"@en . . . "30474" . . . "4"^^ . "26310" . "We found out that the monomer deficient conditions enable to control mechanical and optical properties of plasma polymer films by RF power using plasma-enhanced chemical vapor deposition. The monomer deficient conditions may be characterized by the plasma process pressure (plasma switched on) lower than the basic process pressure (plasma switched off), which means that the concentration of reactive species is not insignificant or is even comparable with the concentration of monomer molecules. The monomer deficient conditions are achieved at lower monomer flow rates (0.5-10 sccm) operated at lower basic process pressures (1-5 Pa). In this study, we plasma polymerized tetravinylsilane at a mass flow rate of 3.8sccm operated at a basic process pressure of 3.0 Pa, and RF power ranging 10-70 W using continuous wave. The plasma process pressure decreased from 1.7 Pa (10 W) to 1.1 Pa (70 W) at enhanced power. The plasma species were monitored by mass spectrometry and correlated with chemical properties of de" . . . .