. . "[F4B2F12F7818]" . . "P\u0159ikryl, Radek" . . . . "Plasma Enhanced Chemical Vapour Deposition of SiO2-Like Films: Monitoring and Optimization of the Process" . . . "4"^^ . . . "This work focuses on high density thin films deposited by PECVD using hexamethyldisiloxane precursor. Optical emission spectroscopy was used for plasma diagnostics. Oxygen transmission rate and infrared spectra of deposited layers were measured. Optimal experimental conditions for low carbon content layers and layers with good barrier properties were determined." . . "Plasma Enhanced Chemical Vapour Deposition of SiO2-Like Films: Monitoring and Optimization of the Process"@en . "I" . "Kr\u010Dma, Franti\u0161ek" . "Plasma Enhanced Chemical Vapour Deposition of SiO2-Like Films: Monitoring and Optimization of the Process" . "4"^^ . "This work focuses on high density thin films deposited by PECVD using hexamethyldisiloxane precursor. Optical emission spectroscopy was used for plasma diagnostics. Oxygen transmission rate and infrared spectra of deposited layers were measured. Optimal experimental conditions for low carbon content layers and layers with good barrier properties were determined."@en . . . "RIV/00216305:26310/12:PU105243!RIV15-MSM-26310___" . . . "Plasma Enhanced Chemical Vapour Deposition of SiO2-Like Films: Monitoring and Optimization of the Process"@en . "158854" . "Blahov\u00E1, Lucie" . "26310" . . "Proch\u00E1zka, Michal" . . "RIV/00216305:26310/12:PU105243" . "Thin film deposition, optical emission spectroscopy, oxygen transmission rate"@en .