"Thickness measurement of thin soft organic films" . . "[6455E52B3505]" . "Siderov, Vasil" . "174342" . "film thickness, chromatic white light, interference microscopy, thin soft organic films"@en . "Siderov, Vasil" . "Mladenova, Daniela" . "Zhivkov, Ivaylo" . "This paper compares chromatic white light (CWL) and interference microscope measurements aiming to find a proper non-contact method for a thickness determination of thin soft organic films. Standard samples with vacuum deposited aluminum films of different thicknesses in the range of 50-1000 nm were prepared and measured by both methods. It was found that the CWL technique is proper for a measurement of thin soft organic films with higher than 40-50 nm film thicknesses. As a complementary feature of the method 2D and 3D surface morphology imaging of the films could be recorded and the surface film roughness could be calculated. In a case of optical inhomogeneity the method requires covering with a uniform high reflective coating. The interference microscopy method results in a relatively lower film thickness with a higher standard deviation and a higher standard relative error. It could be connected with the resolution of the interferograms measured."@en . "O, P(ED0012/01/01)" . "Salyk, Ota" . "RIV/00216305:26310/12:PU100117" . "This paper compares chromatic white light (CWL) and interference microscope measurements aiming to find a proper non-contact method for a thickness determination of thin soft organic films. Standard samples with vacuum deposited aluminum films of different thicknesses in the range of 50-1000 nm were prepared and measured by both methods. It was found that the CWL technique is proper for a measurement of thin soft organic films with higher than 40-50 nm film thicknesses. As a complementary feature of the method 2D and 3D surface morphology imaging of the films could be recorded and the surface film roughness could be calculated. In a case of optical inhomogeneity the method requires covering with a uniform high reflective coating. The interference microscopy method results in a relatively lower film thickness with a higher standard deviation and a higher standard relative error. It could be connected with the resolution of the interferograms measured." . "RIV/00216305:26310/12:PU100117!RIV15-MSM-26310___" . . . . "26310" . "Thickness measurement of thin soft organic films"@en . "Weiter, Martin" . "6"^^ . . . . . . . . "Zhivkov, Ivaylo" . . . "9"^^ . "Ohl\u00EDdal, Miloslav" . "Thickness measurement of thin soft organic films" . . . "Mladenova, Daniela" . . . "Thickness measurement of thin soft organic films"@en . . .