. "Univerzita Komensk\u00E9ho v Bratislave" . "2"^^ . . "2009-01-23+01:00"^^ . "978-80-89186-45-7" . "Bratislava" . "Fragmentation of Tetravinyl Silane in Pulsed RF Discharge" . . "Fragmentation of Tetravinyl Silane in Pulsed RF Discharge"@en . . "Flam\u00EDkov\u00E1, Krist\u00FDna" . "Fragmentation of Tetravinyl Silane in Pulsed RF Discharge"@en . "RIV/00216305:26310/09:PU83914" . "315515" . . . . "The tetravinylsilane fragmentation was studied in pulsed regime of RF discharge by optical emission spectroscopy. Some simple fragments were recognized. The emission intensities of these fragments were strongly dependent on the duty cycle of the discharge. The electron and rotational temperatures were calculated from the spectra and both of them also depended on the duty cycle. The determined electron temperature of about 3500 K was very low in comparison to the energy needed for the tetravinylsilane fragmentation (about 10 eV) and only a few electrons had sufficient energy for the fragmentation. Thus we suppose that excited states play a significant role in the fragmentation process."@en . . . "[73B67BE0D4D3]" . . . . "3"^^ . . "pulsed RF discharge, tetravinylsilane, fragmentation, optical emission spectroscopy"@en . . "26310" . "Z(MSM0021630501)" . "Liptovsk\u00FD J\u00E1n" . "Stud\u00FDnka, Jan" . "The tetravinylsilane fragmentation was studied in pulsed regime of RF discharge by optical emission spectroscopy. Some simple fragments were recognized. The emission intensities of these fragments were strongly dependent on the duty cycle of the discharge. The electron and rotational temperatures were calculated from the spectra and both of them also depended on the duty cycle. The determined electron temperature of about 3500 K was very low in comparison to the energy needed for the tetravinylsilane fragmentation (about 10 eV) and only a few electrons had sufficient energy for the fragmentation. Thus we suppose that excited states play a significant role in the fragmentation process." . "3"^^ . "Proceedings of 17th Symposium on Application of Plasma Processes" . . . "Kr\u010Dma, Franti\u0161ek" . "RIV/00216305:26310/09:PU83914!RIV10-MSM-26310___" . . . . "Fragmentation of Tetravinyl Silane in Pulsed RF Discharge" .