"MATFYZPRESS" . "5"^^ . . "RIV/00216305:26310/03:PU38274" . "7"^^ . . "26310" . "RIV/00216305:26310/03:PU38274!RIV/2004/MSM/263104/N" . . . "2003-06-10+02:00"^^ . "441-445" . . . . . . "Plasma deposition, optical emission spectroscopy, organosilicones"@en . "Havelkov\u00E1, Iveta" . . "P\u0159ikryl, Radek" . "Praha" . "628162" . "Praha" . . . . "\u0160ormov\u00E1, Hana" . "Spectroscopic monitoring of low pressure plasma deposition of Silane and Siloxane based thin films" . "The main part of this work is focused on the identification of the spectra measured during the plasma deposition using the vinyltriethoxysilane in a continual regime and also in a pulsed regime with the varied relative pulse duration and during deposition with an amount of oxygen added in various ratios. The next part is focused on spectroscopic observation during the plasma deposition using the hexamethyldisiloxane and gamma-metacryloxyprophyltrimethoxysilane." . . . "Proceedings of the 12th Annual Conference of Doctoral Students - WDS 2003" . "Spectroscopic monitoring of low pressure plasma deposition of Silane and Siloxane based thin films"@en . . "Z(MSM 263100019)" . "The main part of this work is focused on the identification of the spectra measured during the plasma deposition using the vinyltriethoxysilane in a continual regime and also in a pulsed regime with the varied relative pulse duration and during deposition with an amount of oxygen added in various ratios. The next part is focused on spectroscopic observation during the plasma deposition using the hexamethyldisiloxane and gamma-metacryloxyprophyltrimethoxysilane."@en . "[C57AE617F524]" . . "Spectroscopic monitoring of low pressure plasma deposition of Silane and Siloxane based thin films" . "0"^^ . "0"^^ . "Van\u011Bk, Jan" . . . "\u010Cech, Vladim\u00EDr" . "7"^^ . "80-86732-18-5" . "Kr\u010Dma, Franti\u0161ek" . . . . "Spectroscopic monitoring of low pressure plasma deposition of Silane and Siloxane based thin films"@en . "Ra\u0161kov\u00E1, Zuzana" .