. "Kr\u010Dma, Franti\u0161ek" . "7"^^ . "[D171B1D90B4D]" . . "Ra\u0161kov\u00E1, Zuzana" . "The main part of this work is focused on the identification of the spectra measured during the plasma deposition using the vinyltriethoxysilane in a continual regime and also in a pulsed regime with the varied relative pulse duration and during deposition with an amount of oxygen added in various ratios. The next part is focused on spectroscopic observation during the plasma deposition using the hexamethyldisiloxane and ?\u00D7-metacryloxyprophyltrimethoxysilane."@en . "Spectroscopic Observation of Low Pressure Plasma Deposition of Thin Silane and Siloxane Based Films"@en . . "Spectroscopic Observation of Low Pressure Plasma Deposition of Thin Silane and Siloxane Based Films" . "Havelkov\u00E1, Iveta" . . "Spectroscopic Observation of Low Pressure Plasma Deposition of Thin Silane and Siloxane Based Films"@en . "1-6" . . . . . . . "RIV/00216305:26310/03:PU38246" . "Spectroscopic Observation of Low Pressure Plasma Deposition of Thin Silane and Siloxane Based Films" . "P\u0159ikryl, Radek" . . "628164" . . "Proceedings of ISPC XVI" . "The main part of this work is focused on the identification of the spectra measured during the plasma deposition using the vinyltriethoxysilane in a continual regime and also in a pulsed regime with the varied relative pulse duration and during deposition with an amount of oxygen added in various ratios. The next part is focused on spectroscopic observation during the plasma deposition using the hexamethyldisiloxane and ?\u00D7-metacryloxyprophyltrimethoxysilane." . "Taormina" . "Taormina" . . "\u0160ormov\u00E1, Hana" . . "0"^^ . "IUPAC" . "RIV/00216305:26310/03:PU38246!RIV/2004/MSM/263104/N" . "0"^^ . . "Plasma thin layer deposition, organosilicone films, optical emission spectroscopy"@en . . . . . "Z(MSM 263100019)" . "2003-06-21+02:00"^^ . "6"^^ . . "Van\u011Bk, Jan" . "7"^^ . . "26310" . . "\u010Cech, Vladim\u00EDr" .