"Kav\u00E1lek, Ond\u0159ej" . . . . "1938-5862" . "RIV/00216305:26220/14:PU110192" . "Electrochemical Deposition of Tin and Silicon Studied by EQCM" . . . . "Electrochemical Deposition of Tin and Silicon Studied by EQCM"@en . "Silicon and Tin thin films were prepared by electrochemical deposition on copper and nickel substrates in the Atmosbag. Electrochemical activity is described by cyclic voltammetry and for studying increase of weight were used EQCM. Deposited layers were studied by optic microscopy, electron microscopy and X-ray diffraction"@en . "14108" . "deposition, Tin, Silicon"@en . . . . . "2014" . "48" . . "3"^^ . "10.1149/04801.0017ecst" . . "3"^^ . "S" . "[4C82F680BA0B]" . . "6"^^ . "Silicon and Tin thin films were prepared by electrochemical deposition on copper and nickel substrates in the Atmosbag. Electrochemical activity is described by cyclic voltammetry and for studying increase of weight were used EQCM. Deposited layers were studied by optic microscopy, electron microscopy and X-ray diffraction" . . "ECS Transactions" . "RIV/00216305:26220/14:PU110192!RIV15-MSM-26220___" . "Sedla\u0159\u00EDkov\u00E1, Marie" . "US - Spojen\u00E9 st\u00E1ty americk\u00E9" . . "Vondr\u00E1k, Ji\u0159\u00ED" . "Electrochemical Deposition of Tin and Silicon Studied by EQCM" . "Electrochemical Deposition of Tin and Silicon Studied by EQCM"@en . . "26220" .