. . . "Brno" . "RIV/00216305:26220/13:PU103517!RIV15-MSM-26220___" . "Aluminum nitride thin films were obtained by magnetron sputtering of aluminum target. The films surface was studied by atomic force microscopy and scanning electron microscopy. Using of buffer nitridized layer on the substrate allowed the formation of perfect structure films. Lateral force atomic force microscopy was used to study the morphology heterogeneity. The dependence of films structure on the formation conditions has been defined. The objective of the study is to contribute to the improvement of technological process of dry etching and film deposition."@en . . . . "dry etching, epitaxy, substrate, thin film, scanning probe microscopy"@en . "1"^^ . . . "1"^^ . "89589" . . "2013-04-25+02:00"^^ . "[914C5E3A5BDF]" . "978-80-214-4695-3" . "Morphology and structural investigation of aluminum nitride layers prepared by magnetron sputtering" . . "5"^^ . . "RIV/00216305:26220/13:PU103517" . "Aluminum nitride thin films were obtained by magnetron sputtering of aluminum target. The films surface was studied by atomic force microscopy and scanning electron microscopy. Using of buffer nitridized layer on the substrate allowed the formation of perfect structure films. Lateral force atomic force microscopy was used to study the morphology heterogeneity. The dependence of films structure on the formation conditions has been defined. The objective of the study is to contribute to the improvement of technological process of dry etching and film deposition." . "Dallaeva, Dinara" . "Brno University of Technology" . "Morphology and structural investigation of aluminum nitride layers prepared by magnetron sputtering"@en . . . "26220" . "Proceedings of the 19th Conference Student EEICT 2013" . . . . . "Morphology and structural investigation of aluminum nitride layers prepared by magnetron sputtering" . "Dallaeva, Dinara" . "Litera, Tabor 43a, 61200 Brno" . "P(ED2.1.00/03.0072), P(GAP102/11/0995)" . . "Morphology and structural investigation of aluminum nitride layers prepared by magnetron sputtering"@en .