"1802-4564" . "[929B86B55CB1]" . "Dallaeva, Dinara" . "3"^^ . "Bilalov, Bilal" . "5" . . "Theoretical and Experimental Investigation of SiC Thin Films Surface" . "Theoretical and Experimental Investigation of SiC Thin Films Surface"@en . "RIV/00216305:26220/12:PU100610" . . "1"^^ . "Tom\u00E1nek, Pavel" . "174185" . "ElectroScope - http://www.electroscope.zcu.cz" . . . "26220" . . . . . . "2012" . "This study describes morphology and structure of SiC thin films which are grown up by sublimation epitaxy in vacuum on the 6H-SiC substrates with thickness from tens of nanometers up to units of micrometers. Fashioned films are quite uniform in surface and volume. The crystal properties of the wafers and epitaxial layers are studied by electron diffraction investigation, X-ray techniques, and scanning probe microscopy. X-ray rocking curves show that structural perfection of SiC films is comparable with the structural perfection of monocrystalline 6H-SiC substrates. Calculated lattice parameters of epilayer by X-ray diffractometry also match with known values for 6H-SiC. Electron-diffraction measurement gives the confirmation of the crystallinity of the obtained layers and it is also proved by scanning probe microscopy. This technology allows making of defect treatment of the wafer in dependence on epitaxial conditions. Fundamental analysis in this field allows optimize conditions of thin films formati" . "Theoretical and Experimental Investigation of SiC Thin Films Surface" . . . "silicon carbide, sublimation, atomic force microscopy"@en . "P(ED2.1.00/03.0072), P(GAP102/10/2013), P(LH11060)" . "5"^^ . . "This study describes morphology and structure of SiC thin films which are grown up by sublimation epitaxy in vacuum on the 6H-SiC substrates with thickness from tens of nanometers up to units of micrometers. Fashioned films are quite uniform in surface and volume. The crystal properties of the wafers and epitaxial layers are studied by electron diffraction investigation, X-ray techniques, and scanning probe microscopy. X-ray rocking curves show that structural perfection of SiC films is comparable with the structural perfection of monocrystalline 6H-SiC substrates. Calculated lattice parameters of epilayer by X-ray diffractometry also match with known values for 6H-SiC. Electron-diffraction measurement gives the confirmation of the crystallinity of the obtained layers and it is also proved by scanning probe microscopy. This technology allows making of defect treatment of the wafer in dependence on epitaxial conditions. Fundamental analysis in this field allows optimize conditions of thin films formati"@en . . "Theoretical and Experimental Investigation of SiC Thin Films Surface"@en . . "RIV/00216305:26220/12:PU100610!RIV13-GA0-26220___" . . . "Dallaeva, Dinara" . . "CZ - \u010Cesk\u00E1 republika" .