"17th European Microelectronics and Packaging Conference & Exhibition" . . "Tofel, Pavel" . . "RIV/00216305:26220/09:PU81660" . "4"^^ . . "Interface Resistance between Polymer Based Conducting and Resistive Layers" . "Chv\u00E1tal, Milo\u0161" . "Italie" . . . . "Majzner, Ji\u0159\u00ED" . . "4"^^ . "Neuveden" . "320011" . "Sedl\u00E1kov\u00E1, Vlasta" . . "Interface Resistance between Polymer Based Conducting and Resistive Layers"@en . "978-1-4244-4722-0" . "4"^^ . . . . "We have studied the interface resistance between the polymer based conducting and resistive thick film layers. The samples were made using different resistive pastes and dipping silvers. The composite of carbon and graphite (C/Gr) conducting particles suspended in different polymer vehicles were used for the thick film resistive layers preparation. Interface resistance RI created between the contact layer made from dipping silver (DiAg) and resistive layer was determined from the surface potential distribution measurements and its value was less than 1% of total sample resistance. Measuring apparatus DISPOT designed in our laboratory provides the measuring of a surface potential distribution. The measuring probe is sliding on the surface of measured structure and potential change between the successive steps is normalized by the total current flowing through the structure. Elementary step (the shortest distance between two measurements) is 1.25 m. The equipment is arranged for current and voltage fou"@en . "Rimini" . "Interface Resistance between Polymer Based Conducting and Resistive Layers"@en . . . . "[92C7E04D3025]" . "We have studied the interface resistance between the polymer based conducting and resistive thick film layers. The samples were made using different resistive pastes and dipping silvers. The composite of carbon and graphite (C/Gr) conducting particles suspended in different polymer vehicles were used for the thick film resistive layers preparation. Interface resistance RI created between the contact layer made from dipping silver (DiAg) and resistive layer was determined from the surface potential distribution measurements and its value was less than 1% of total sample resistance. Measuring apparatus DISPOT designed in our laboratory provides the measuring of a surface potential distribution. The measuring probe is sliding on the surface of measured structure and potential change between the successive steps is normalized by the total current flowing through the structure. Elementary step (the shortest distance between two measurements) is 1.25 m. The equipment is arranged for current and voltage fou" . "2009-06-15+02:00"^^ . "Interface Resistance between Polymer Based Conducting and Resistive Layers" . . . "RIV/00216305:26220/09:PU81660!RIV10-MSM-26220___" . "P(GD102/09/H074), Z(MSM0021630503)" . . . . . "interface resistance, 1/f noise, non-linearity, polymer based TFR"@en . "26220" . . .