. "1"^^ . . . . "Pr\u00E1ce se zab\u00FDv\u00E1 anal\u00FDzou nanostrukturovan\u00FDch vrstev, deponovan\u00FDch na povrch monokrystalick\u00E9ho k\u0159em\u00EDku pomoc\u00ED vysokofrekven\u010Dn\u00EDho magnetronov\u00E9ho napra\u0161ov\u00E1n\u00ED. Obsah pr\u00E1ce je zam\u011B\u0159en na aplikaci magnetronov\u00E9ho napra\u0161ov\u00E1n\u00ED jako alternativn\u00ED metody pro depozici pasiva\u010Dn\u00EDch a antireflexn\u00EDch vrstev na k\u0159em\u00EDkov\u00FDch sol\u00E1rn\u00EDch \u010Dl\u00E1nc\u00EDch. Je navr\u017Een postup pro p\u0159eddepozi\u010Dn\u00ED \u010Di\u0161t\u011Bn\u00ED povrch\u016F k\u0159em\u00EDkov\u00FDch substr\u00E1t\u016F plazmatick\u00FDm lept\u00E1n\u00EDm v prost\u0159ed\u00ED Ar/H2 a reaktivn\u00ED depozici hydrogenovan\u00FDch vrstev nitridu k\u0159em\u00EDku a nitridu hlin\u00EDku ve sm\u011Bsi plyn\u016F Ar/N2/H2. \u010C\u00E1st pr\u00E1ce je v\u011Bnov\u00E1na popisu experiment\u00E1ln\u00EDch depozic pseudokarbidov\u00FDch vrstev z k\u0159em\u00EDkov\u00E9ho ter\u010De a reaktivn\u00EDho acetylenu (C2H2) v pr\u016Fmyslov\u00FDch podm\u00EDnk\u00E1ch. Velk\u00FD d\u016Fraz je kladen na zkoum\u00E1n\u00ED vlastnost\u00ED vrstev a vytv\u00E1\u0159en\u00FDch pom\u011Br\u016F na rozhran\u00ED k\u0159em\u00EDk-vrstva za pomoci n\u011Bkolika standardn\u00EDch a speci\u00E1ln\u00EDch m\u011B\u0159\u00EDc\u00EDch metod. Struktur\u00E1ln\u00ED slo\u017Een\u00ED napra\u0161ovan\u00FDch vrstev je ana"@cs . . . "Characterisation on nanostructure deposited by high-frequency magnetron sputtering"@en . "RIV/00216305:26220/08:PU78719!RIV10-MSM-26220___" . "This thesis deals with the analysis of nano-structured layers deposited by highfrequency magnetron sputtering on the monocrystalline silicon surface. The content of the work focuses on the magnetron sputtering application as an alternative method for passivation and antireflection layers deposition of silicon solar cells. The procedure of pre-deposite silicon surface cleaning by plasma etching in the Ar/H2 gas mixture atmosphere is suggested. In the next step the silicon nitride and aluminum nitride layers with hydrogen content in Ar/N2/H2 gas mixture by magnetron sputtering are deposited. One part of the thesis describes an experimental pseudo-carbide films deposition from a silicon target in the atmosphere of acetylene (C2H2). An emphasis is placed on the research of sputtered layers properties and on the conditions on the silicon-layer interface with the help of the standard as well as special measurement methods. Sputtered layers structure is analyzed by modern X-ray spectroscopy (XPS) and by Four"@en . "RIV/00216305:26220/08:PU78719" . "Charakterizace nanostruktur deponovan\u00FDch vysokofrekven\u010Dn\u00EDm magnetronov\u00FDm napra\u0161ov\u00E1n\u00EDm" . . . "Magnetron sputtering, X-ray spectroscopy, Infrared spectroscopy, MW-PCD, Ellipsometry, Spectrophotometry, Surface recombination, Lifetime, Surface passivation, Antireflection coating, Silicon nitride, Aluminum nitride, Silicon carbide"@en . . "Pr\u00E1ce se zab\u00FDv\u00E1 anal\u00FDzou nanostrukturovan\u00FDch vrstev, deponovan\u00FDch na povrch monokrystalick\u00E9ho k\u0159em\u00EDku pomoc\u00ED vysokofrekven\u010Dn\u00EDho magnetronov\u00E9ho napra\u0161ov\u00E1n\u00ED. Obsah pr\u00E1ce je zam\u011B\u0159en na aplikaci magnetronov\u00E9ho napra\u0161ov\u00E1n\u00ED jako alternativn\u00ED metody pro depozici pasiva\u010Dn\u00EDch a antireflexn\u00EDch vrstev na k\u0159em\u00EDkov\u00FDch sol\u00E1rn\u00EDch \u010Dl\u00E1nc\u00EDch. Je navr\u017Een postup pro p\u0159eddepozi\u010Dn\u00ED \u010Di\u0161t\u011Bn\u00ED povrch\u016F k\u0159em\u00EDkov\u00FDch substr\u00E1t\u016F plazmatick\u00FDm lept\u00E1n\u00EDm v prost\u0159ed\u00ED Ar/H2 a reaktivn\u00ED depozici hydrogenovan\u00FDch vrstev nitridu k\u0159em\u00EDku a nitridu hlin\u00EDku ve sm\u011Bsi plyn\u016F Ar/N2/H2. \u010C\u00E1st pr\u00E1ce je v\u011Bnov\u00E1na popisu experiment\u00E1ln\u00EDch depozic pseudokarbidov\u00FDch vrstev z k\u0159em\u00EDkov\u00E9ho ter\u010De a reaktivn\u00EDho acetylenu (C2H2) v pr\u016Fmyslov\u00FDch podm\u00EDnk\u00E1ch. Velk\u00FD d\u016Fraz je kladen na zkoum\u00E1n\u00ED vlastnost\u00ED vrstev a vytv\u00E1\u0159en\u00FDch pom\u011Br\u016F na rozhran\u00ED k\u0159em\u00EDk-vrstva za pomoci n\u011Bkolika standardn\u00EDch a speci\u00E1ln\u00EDch m\u011B\u0159\u00EDc\u00EDch metod. Struktur\u00E1ln\u00ED slo\u017Een\u00ED napra\u0161ovan\u00FDch vrstev je ana" . . . . "[23AC08F07CD5]" . "Characterisation on nanostructure deposited by high-frequency magnetron sputtering"@en . "26220" . "Z(MSM0021630503)" . . . . "Charakterizace nanostruktur deponovan\u00FDch vysokofrekven\u010Dn\u00EDm magnetronov\u00FDm napra\u0161ov\u00E1n\u00EDm"@cs . . . . "Charakterizace nanostruktur deponovan\u00FDch vysokofrekven\u010Dn\u00EDm magnetronov\u00FDm napra\u0161ov\u00E1n\u00EDm"@cs . . "Charakterizace nanostruktur deponovan\u00FDch vysokofrekven\u010Dn\u00EDm magnetronov\u00FDm napra\u0161ov\u00E1n\u00EDm" . "H\u00E9gr, Ond\u0159ej" . . . "359665" . . . . "1"^^ . .