. "\u0160ikula, Josef" . "[2633D6050814]" . . . "0-7354-0267-1" . "RIV/00216305:26220/05:PU52183!RIV06-MSM-26220___" . "American Institute of Physics" . . "135-138" . "Noise and Fluctuations" . "Noise and Carge Storage in Nb2O5 Thin Films"@cs . "United States of America" . . . . . . "Grmela, Lubom\u00EDr" . "Noise, Poole-Frenkel transport, Tunnelling, Niobium Pentoxide, MIS structure"@en . . "RIV/00216305:26220/05:PU52183" . "Sedl\u00E1kov\u00E1, Vlasta" . "Tacano, Munecazu" . "Noise and Carge Storage in Nb2O5 Thin Films"@en . "2005-09-19+02:00"^^ . "Z(MSM0021630503)" . . "Noise and Carge Storage in Nb2O5 Thin Films"@en . "4"^^ . "532936" . "H\u00F6schl, Pavel" . . "26220" . . "Hashiguchi, Sumihisa" . "Salamanca, Spain" . "A low frequency noise and DC leakage current measurements have been performed on the MIS structure NbO - Nb2O5 - MnO2. The mechanism of current flow and current noise sources were determined from these measurements. The insulating layer thickness is 50 to 150 nm, relative permittivity about 38. The charge is accumulated not only on NbO and MnO2 electrodes, but also in the Nb2O5 insulating layer. The charge carrier transport is determined by the Poole-Frenkel mechanism and tunnelling in the normal mode ((for NbO electrode positive). In this case g-r noise is dominant for Poole-Frenkel mechanism and 1/f noise is dominant for tunnelling."@en . "3"^^ . "Noise and Carge Storage in Nb2O5 Thin Films"@cs . . "Sita, Z." . . "Noise and Carge Storage in Nb2O5 Thin Films" . . "A low frequency noise and DC leakage current measurements have been performed on the MIS structure NbO - Nb2O5 - MnO2. The mechanism of current flow and current noise sources were determined from these measurements. The insulating layer thickness is 50 to 150 nm, relative permittivity about 38. The charge is accumulated not only on NbO and MnO2 electrodes, but also in the Nb2O5 insulating layer. The charge carrier transport is determined by the Poole-Frenkel mechanism and tunnelling in the normal mode ((for NbO electrode positive). In this case g-r noise is dominant for Poole-Frenkel mechanism and 1/f noise is dominant for tunnelling." . "A low frequency noise and DC leakage current measurements have been performed on the MIS structure NbO - Nb2O5 - MnO2. The mechanism of current flow and current noise sources were determined from these measurements. The insulating layer thickness is 50 to 150 nm, relative permittivity about 38. The charge is accumulated not only on NbO and MnO2 electrodes, but also in the Nb2O5 insulating layer. The charge carrier transport is determined by the Poole-Frenkel mechanism and tunnelling in the normal mode ((for NbO electrode positive). In this case g-r noise is dominant for Poole-Frenkel mechanism and 1/f noise is dominant for tunnelling."@cs . "Noise and Carge Storage in Nb2O5 Thin Films" . . . . . "7"^^ .