. "TCAD tools in process and device simulation"@en . . . . "Recman, Milan" . "Brno" . . . "Brno" . "The enormous power of today`s computers has enabled the TCAD (Technology CAD) to become a workhorse of microelectronics progress. The development of sophisticated and efficient one-, two- and three-dimensional semiconductor process and device software tools will provide the engineers significant leverage in conducting research into new areas of IC technologies. The contribution reviews process and device simulation tools in common use and deals with the required features of the new TCAD tools generaation."@en . "Ing. Zden\u011Bk Novotn\u00FD CSc." . "187-192" . "The enormous power of today`s computers has enabled the TCAD (Technology CAD) to become a workhorse of microelectronics progress. The development of sophisticated and efficient one-, two- and three-dimensional semiconductor process and device software tools will provide the engineers significant leverage in conducting research into new areas of IC technologies. The contribution reviews process and device simulation tools in common use and deals with the required features of the new TCAD tools generaation." . "6"^^ . . "80-214-2180-0" . "0"^^ . "[1B37FF8A1167]" . "1"^^ . . "RIV/00216305:26220/02:PU30455!RIV/2003/MSM/262203/N" . "0"^^ . . . "1"^^ . "TCAD tools in process and device simulation" . "TCAD tools in process and device simulation" . . "TCAD tools in process and device simulation"@en . . "Electronics Devices and Systems EDS02. Proceedings." . . . "Z(MSM 262200022)" . . "666384" . "RIV/00216305:26220/02:PU30455" . "2002-09-09+02:00"^^ . "26220" . . "TCAD, process simulation, device simulation,"@en .