. "PMPSi (poly(methyl-phenylsilane)) films were deposited by the spin-coating method on single crystal silicon substrates from toluene solution. Their thickness was about 200 nm. We have studied the stability of these films, which is crucial for their technological applications [1,2], by in-situ spectroscopic ellipsometry (SE) and X-ray Photoelectron Spectroscopy (XPS). This has been proved as a proper combination of monitoring methods as XPS gives direct insight into compositional and structural changes oof the polymer (5-10 nm below the surface) and the SE technique is very sensitive to the changes in PMPSi films. We have used rotating analyzer ellipsometry in the energy interval 3.4 - 4.8 eV to cover the onset of absorption starting with the lowest excitonic band involving electronic stays localized on Si. The ellipsometer is mounted on an UHV chamber, the angles of incident light can be adjusted to 45 or 67.5 . Our recent study [3] indicates that the Si-Si bonds in the polymer main chain (Si-backbo" . "\u010Cechal, Jan" . . "UV in-situ degradation of PMPSi analysed by spectroscopic ellipsometry, XPS and TDS"@en . . "In-situ UV degradace PMPSi studovan\u00E1 spektroskopickou elipsometri\u00ED, XPS a TDS"@cs . "RIV/00216305:26210/05:PU54249!RIV06-MSM-26210___" . . "Huml\u00ED\u010Dek, Josef" . "Z(MSM0021630508)" . "spectroscopic ellipsometry; XPS; TDS; PMPSi"@en . "In-situ UV degradace PMPSi studovan\u00E1 spektroskopickou elipsometri\u00ED, XPS a TDS"@cs . . "1" . "UV in-situ degradation of PMPSi analysed by spectroscopic ellipsometry, XPS and TDS"@en . "Brandejsov\u00E1, Eva" . "548307" . "Navr\u00E1til, Karel" . . . . . . . "[7C352D54B187]" . "UV in-situ degradation of PMPSi analysed by spectroscopic ellipsometry, XPS and TDS" . "In-situ UV degradace PMPSi studovan\u00E1 spektroskopickou elipsometri\u00ED, XPS a TDS."@cs . . "Vienna" . "Poto\u010Dek, Michal" . . "26210" . . "\u0160ikola, Tom\u00E1\u0161" . . . . "RIV/00216305:26210/05:PU54249" . . . "Nebojsa, Alois" . "UV in-situ degradation of PMPSi analysed by spectroscopic ellipsometry, XPS and TDS" . . . "PMPSi (poly(methyl-phenylsilane)) films were deposited by the spin-coating method on single crystal silicon substrates from toluene solution. Their thickness was about 200 nm. We have studied the stability of these films, which is crucial for their technological applications [1,2], by in-situ spectroscopic ellipsometry (SE) and X-ray Photoelectron Spectroscopy (XPS). This has been proved as a proper combination of monitoring methods as XPS gives direct insight into compositional and structural changes oof the polymer (5-10 nm below the surface) and the SE technique is very sensitive to the changes in PMPSi films. We have used rotating analyzer ellipsometry in the energy interval 3.4 - 4.8 eV to cover the onset of absorption starting with the lowest excitonic band involving electronic stays localized on Si. The ellipsometer is mounted on an UHV chamber, the angles of incident light can be adjusted to 45 or 67.5 . Our recent study [3] indicates that the Si-Si bonds in the polymer main chain (Si-backbo"@en . "8"^^ . "Bonaventurov\u00E1 - Zrzaveck\u00E1, Olga" . . "7"^^ . .