. . . . . "58" . . . . "2003-01-01+01:00"^^ . "Dependence of the Normalized Absorbance of the DLC:SiOx Thin Films on the Flow Rate of HMDSO"@en . "P(GA202/00/P037), Z(MSM 143100003)" . "plasma; DLC; films; methane; HMDSO; pecvd; radio frequency; discharge; FTIR; normalized absorbance"@en . . "RIV/00216224:14330/03:00008608!RIV08-MSM-14330___" . "Dependence of the Normalized Absorbance of the DLC:SiOx Thin Films on the Flow Rate of HMDSO" . . . "Hard diamond like carbon (DLC) films with an addition of SiOx were deposited by capacitively coupled rf discharges from mixture of methane and hexamethyldisiloxane (HMDSO). The flow rate was changed in order to vary the SiOx content in the films. Thickness of the films was determined by ellipsometry. FTIR spectra showed presence of C-H bonds as well as silicon bonded to hydrogen and hydrocarbon groups. In the region 630-900 cm-1 normalized absorbance was computed. It is shown that the concentration of silicon containing bonds grows with the flow rate of HMDSO growing."@cs . "RIV/00216224:14330/03:00008608" . . "Dependence of the Normalized Absorbance of the DLC:SiOx Thin Films on the Flow Rate of HMDSO"@cs . . "Dependence of the Normalized Absorbance of the DLC:SiOx Thin Films on the Flow Rate of HMDSO"@en . "3"^^ . . "[3810209915B1]" . . "3"^^ . "23.-24. 9. 2003, Brno" . . "Vysok\u00E9 u\u010Den\u00ED technick\u00E9 v Brn\u011B. Fakulta strojn\u00EDho in\u017Een\u00FDrstv\u00ED. \u00DAstav materi\u00E1lov\u00FDch v\u011Bd a in\u017Een\u00FDrstv\u00ED; \u010Cesk\u00E1 spole\u010Dnost pro nov\u00E9 materi\u00E1ly a technologie" . "Dependence of the Normalized Absorbance of the DLC:SiOx Thin Films on the Flow Rate of HMDSO"@cs . "Zaj\u00ED\u010Dkov\u00E1, Lenka" . "Hard diamond like carbon (DLC) films with an addition of SiOx were deposited by capacitively coupled rf discharges from mixture of methane and hexamethyldisiloxane (HMDSO). The flow rate was changed in order to vary the SiOx content in the films. Thickness of the films was determined by ellipsometry. FTIR spectra showed presence of C-H bonds as well as silicon bonded to hydrogen and hydrocarbon groups. In the region 630-900 cm-1 normalized absorbance was computed. It is shown that the concentration of silicon containing bonds grows with the flow rate of HMDSO growing." . "2"^^ . "Dependence of the Normalized Absorbance of the DLC:SiOx Thin Films on the Flow Rate of HMDSO" . . . "JUNIORMAT 03" . "603088" . . "Valtr, Miroslav" . . "80-214-2462-1" . "Bur\u0161\u00EDkov\u00E1, Vilma" . "Hard diamond like carbon (DLC) films with an addition of SiOx were deposited by capacitively coupled rf discharges from mixture of methane and hexamethyldisiloxane (HMDSO). The flow rate was changed in order to vary the SiOx content in the films. Thickness of the films was determined by ellipsometry. FTIR spectra showed presence of C-H bonds as well as silicon bonded to hydrogen and hydrocarbon groups. In the region 630-900 cm-1 normalized absorbance was computed. It is shown that the concentration of silicon containing bonds grows with the flow rate of HMDSO growing."@en . . . "14330" . . . . . "Brno" . .