"RIV/00216224:14310/08:00026016" . "1"^^ . "DE - Spolkov\u00E1 republika N\u011Bmecko" . . . "10" . "[9A27B02C9F68]" . "Effect of pressure on efficiency of UV curing of CVD-derived low-k material at different wavelengths" . . "Verdonck, Patrick" . . "14310" . "Low-k dielectrics prepared by CVD in the form of 200 nm thick layers on Si wafers were thermally treated at 410 C and irradiated using UV lamps emitting photons of different wavelengths around 172 nm, 185 nm, and 222 nm. The treatment was performed in high vacuum and under a nitrogen atmosphere at various pressures ranging from 0.1 mbar up to 700 mbar. Subsequently, the samples were investigated using FTIR transmission spectroscopy, contact angle measurement, X-ray photoelectron spectrometry (XPS), time-of-flight secondary ion mass spectrometry (TOF-SIMS), X-ray reflectometry (XRR), surface acoustic wave spectrometry (SAW), and purged UV spectroscopic ellipsometry (PUVSE)."@en . "Microelectronic Engineering" . "Buchmeiser, M. R." . . "RIV/00216224:14310/08:00026016!RIV10-MSM-14310___" . "Gerlach, J. W." . "Mar\u0161\u00EDk, P\u0159emysl" . . "Prager, Lutz" . "Naumov, S." . . . "0167-9317" . . "Effect of pressure on efficiency of UV curing of CVD-derived low-k material at different wavelengths" . "Pistol, L." . "Effect of pressure on efficiency of UV curing of CVD-derived low-k material at different wavelengths"@en . . "low-k; UV curing"@en . "Wennrich, L." . "4"^^ . "Baklanov, Mikhail" . "Low-k dielectrics prepared by CVD in the form of 200 nm thick layers on Si wafers were thermally treated at 410 C and irradiated using UV lamps emitting photons of different wavelengths around 172 nm, 185 nm, and 222 nm. The treatment was performed in high vacuum and under a nitrogen atmosphere at various pressures ranging from 0.1 mbar up to 700 mbar. Subsequently, the samples were investigated using FTIR transmission spectroscopy, contact angle measurement, X-ray photoelectron spectrometry (XPS), time-of-flight secondary ion mass spectrometry (TOF-SIMS), X-ray reflectometry (XRR), surface acoustic wave spectrometry (SAW), and purged UV spectroscopic ellipsometry (PUVSE)." . "85" . . . "000260343600038" . . "10"^^ . . "Schneider, Dieter" . "365204" . "Z(MSM0021622410)" . "Effect of pressure on efficiency of UV curing of CVD-derived low-k material at different wavelengths"@en .