"Optical Property Changes in Low-k Films upon Ultraviolet-Assisted Curing"@en . "Ultraviolet-assisted curing (UV curing) has been recently applied to enhance the mechanical properties of low-k films. Knowledge about which ultraviolet energies are most effective is still limited and the consequences of applying the UV-curing process to integrated stacks in on-chip interconnects unknown. To clarify these open questions we investigated the optical properties of a SiCOH low-k layer by purged ultraviolet spectroscopic ellipsometry in the energy region 2-9 eV. The complex refractive index of the low-k film shows an absorption edge with a superimposed absorption band at 6.4 eV that vanishes upon ultraviolet-assisted curing. Comparison with Fourier transform infrared transmission demonstrates that the absorption at 6.4 eV must be attributed to the organic porogens, which have also influences on the absorption edge."@en . . "14310" . "000254779700057" . "Maex, Karen" . "Mar\u0161\u00EDk, P\u0159emysl" . "RIV/00216224:14310/08:00026015!RIV10-MSM-14310___" . "Z(MSM0021622410)" . . . "6"^^ . "0013-4651" . . "Optical Property Changes in Low-k Films upon Ultraviolet-Assisted Curing"@en . "155" . "1"^^ . . . "RIV/00216224:14310/08:00026015" . "Iacopi, Francesca" . "Baklanov, Mikhail" . "BE - Belgick\u00E9 kr\u00E1lovstv\u00ED" . "low-k; ellipsometry; UV-cure"@en . . . "[98A3F7AEA5E8]" . "5" . "Eslava, Salvador" . "Ultraviolet-assisted curing (UV curing) has been recently applied to enhance the mechanical properties of low-k films. Knowledge about which ultraviolet energies are most effective is still limited and the consequences of applying the UV-curing process to integrated stacks in on-chip interconnects unknown. To clarify these open questions we investigated the optical properties of a SiCOH low-k layer by purged ultraviolet spectroscopic ellipsometry in the energy region 2-9 eV. The complex refractive index of the low-k film shows an absorption edge with a superimposed absorption band at 6.4 eV that vanishes upon ultraviolet-assisted curing. Comparison with Fourier transform infrared transmission demonstrates that the absorption at 6.4 eV must be attributed to the organic porogens, which have also influences on the absorption edge." . . . "8"^^ . "Optical Property Changes in Low-k Films upon Ultraviolet-Assisted Curing" . "Journal of the electrochemical society" . "Kirschhock, Christine" . . . "Optical Property Changes in Low-k Films upon Ultraviolet-Assisted Curing" . "385018" . "Martens, Johan" . . . "Eymery, Guillaume" . .